2015
DOI: 10.1016/j.jallcom.2015.02.162
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Observation of low resistivity and high mobility in Ga doped ZnO thin films grown by buffer assisted pulsed laser deposition

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Cited by 40 publications
(17 citation statements)
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References 31 publications
(34 reference statements)
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“…The equilibrium growth conditions are reflected in the chemical potentials, m i which, when varied, can simulate the experimental partial pressures defining the conditions of n and p-type defect formation. This is done within the constraint of the calculated enthalpy of the host, as per eqn (2).…”
Section: 45mentioning
confidence: 99%
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“…The equilibrium growth conditions are reflected in the chemical potentials, m i which, when varied, can simulate the experimental partial pressures defining the conditions of n and p-type defect formation. This is done within the constraint of the calculated enthalpy of the host, as per eqn (2).…”
Section: 45mentioning
confidence: 99%
“…The unique properties of these indispensable materials are unusual by traditional principles; the wide band gap required for optical transparency (E g 4 3.1 eV) which separates the valence band (VB) from the conduction band (CB) leads to highly resistive semiconductor behaviour in pure stoichiometric ZnO, due to the low probability of electron excitation across this threshold. However, doping of the material offers a solution to this dilemma; extrinsic doping by artificial introduction of substitutional impurities such as Al(III) 1 or Ga(III) 2 on Zn(II) crystallographic sites results in an effective local excess of electrons at the defect sites. This produces an electron donor level close to the CB minimum (CBM), which facilitates donation of electrons into the CB to confer electrical conductivity to the material whilst the wide optical band gap is retained.…”
Section: Introductionmentioning
confidence: 99%
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“…ZnO thin films can be produced by several techniques like magnetron sputtering [10], reactive evaporation [11], pulsed laser deposition [12], sol gel technique [13] and spray pyrolysis [14]. Because of the advantages of low cost, simple processing, easy control of the film thickness and large range deposition temperatures, the spray ultrasonic is an extremely reliable technique for the deposition of thin films and is used in industry for large scale production.…”
Section: Introductionmentioning
confidence: 99%