“…ETL (Electron Transport Layer) is used to dissuade cell short circuits by obstructing holes from reaching the FTO in addition to separating electron hole pairs and injecting photo generated electrons into n-type materials like TiO 2 , ZnO, and SnO 2 . TiO 2 is the most often utilized ETL material due to its adequate conduction band and high electron mobility, high transparency, exquisite carrier separation ability, environmental stability, and simple fabrication procedure [6]. Numerous metal oxides that consolidate at low temperatures, such as ZnO, SnO 2 , In 2 O 3 , and WO 3 , offer suitable energy levels for perovskite electron injection as alternatives to TiO 2 for electron transport.…”