Numerical simulation of high-intensity metal ion beam generation

Koval, T. V.; Ryabchikov, A. I.; An, Tran My Kim; Shevelev, A. É.; Sivin, D. O.; Ivanova, Anna I.; Paltsev, D M

doi:10.1088/1742-6596/1115/3/032007

Cited by 3 publications

(2 citation statements)

References 14 publications

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“…The neutralization time is determined by leaving of plasma ions from the beam. As shown by the results of numerical simulation, at low-energy high-intensity metal ion beam formation [11], this time does not exceed several microseconds. At the first stage, the ion density in the beam at the input to the drift space is almost an order of magnitude lower than the electron density in the plasma.…”

Section: Studying the High-power Density Titanium Ion Beam Formationmentioning

confidence: 70%

High-intensity ion beams with submillisecond duration for synergistic of ion implantation and energy impact on the surface

Ryabchikov¹,

Sivin²,

Dektyarev³

2022

8th International Congress on Energy Fluxes and Radiation Effects

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The development of methods to modify materials based on the synergistic high-intensity implantation and simultaneous energy impact on the ion-doped layer involves using the pulsed and repetitively-pulsed beams of metal and gas ion beams with micro-submillisecond duration with high pulsed power density. The paper presents the results of experimental studies on the formation of pulsed and repetitively-pulsed high-intensity beams of titanium ions with a pulse duration from 150 to 500 μs. The plasma flow was generated by a vacuum arc discharge. To obtain ion beams with a power density in the range from several tens to several hundreds of kilowatts per square centimeter, ballistic focusing of ions was used using an extracting grid electrode in the form of a part of a sphere. The features of the forming the high-power repetitively-pulsed beams of titanium ions were studied using both the ion source “Rainbow 5”. Data are presented on the influence of the ion beam space charge neutralization processes at current densities from fractions to several amperes per square centimeter on the efficiency of the ion beam’s transport and focusing at accelerating voltages from 10 to 30 kV.

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Section: Studying the High-power Density Titanium Ion Beam Formationmentioning

confidence: 70%

High-intensity ion beams with submillisecond duration for synergistic of ion implantation and energy impact on the surface

Ryabchikov¹,

Sivin²,

Dektyarev³

2022

8th International Congress on Energy Fluxes and Radiation Effects

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“…This can be achieved easily, as most LTPs have low plasma potential (10-1000 V) and are unmagnetized or weakly magnetized. Thus moderate ion beam (IB) energy and current density (10 eV-60 keV, ∼2 mA cm −2 ) [20,21] are sufficient to modulate or even sustain the LTPs. Various ion sources can be used for these applications, such as Kaufman ion source [22], end-Hall ion source [23], anode layer linear ion source [24] et al indeed, the plasma can be alone produced by the energetic beam of ions along as reported by Herrmann and Fessenden [25] decades ago.…”

Section: Introductionmentioning

confidence: 99%

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Zhou¹,

Wang²,

Wu³

et al. 2022

Plasma Sources Sci. Technol.

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This work proposes to use the Ar+ ion beam (IB) injection to modulate the properties of the single-frequency capacitively coupled plasma (CCP). The particle-in-cell/Monte Carlo collisions (PIC/MCC) method is used to simulate the plasma characteristics after the IB (2 keV, 0.5A) is injected into the discharge area from the grounded electrode. The results show that the IB can effectively increase the plasma density, reduce the electron energy, increase the self-bias voltage, and thus increase ion flux and broaden the ion energy distribution function on the electrode. Furthermore, transition from $\alpha$-mode to $\gamma$-mode occurs by increasing the secondary electron emission coefficient γ and discharge pressure. In general, the IB injection can be used as a complementary tool to control the plasma properties of CCP.

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Ballistic formation of high-intensity low-energy gas ion beams

Ryabchikov

Sivin

Shevelev

et al. 2020

Review of Scientific Instruments

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The development of the method of high-intensity implantation of low-energy ions requires the design of an efficient system for generating high-intensity ion beams of various elements with a current density of tens and hundreds of milliamperes per square centimeter with ion energies not exceeding some kiloelectronvolt. This paper considers the regularities of formation of high-intensity beams of nitrogen ions and argon and mixed beams of argon and hydrogen ions in spherical and cylindrical grid systems with ballistic focusing of the ion beam. The studies were carried out with the plasma-immersion formation of repetitively pulsed ion beams with duration from units to hundreds of microseconds and a pulse frequency of up to 105 pulses/s with negative bias potentials in the range from 0.6 to 3 kV. The possibility of stable formation of gas ion beams with an ion current density of up to 0.7 A/cm2 is demonstrated.

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Numerical simulation of high-intensity metal ion beam generation

Cited by 3 publications

References 14 publications

High-intensity ion beams with submillisecond duration for synergistic of ion implantation and energy impact on the surface

High-intensity ion beams with submillisecond duration for synergistic of ion implantation and energy impact on the surface

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Ballistic formation of high-intensity low-energy gas ion beams

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