Numerical research of selectively photoionization in thick atom vapor medium

Abstract

The pulse deformation and time delay, which appear when the laser propagates in a thick atom vapor, influence the ionization yield and selectivity of atomic multi-step photoionization process directly. In this paper, we study the propagation of laser pulse and atomic photoionization in a thick atom vapor medium according to the atom vapor laser isotope separation. The process of atomic multi-step photoionization and the propagation of laser in a thick medium are described by density matrix equation and Maxwell equations, respectively. The medium consists of target isotope and non-target isotope, which is non-resonantly excited. Through numerical solution of the coupled equations we illustrate the propagation characteristics of laser and the influences of atom vapor parameters and laser parameters on average ionization yield and average selectivity in a thick medium. The important results of calculation are as follows:when the atom vapor medium is rather thick, the average ionization yield increases while average selectivity decreases with the increase of laser power. When the atom vapor is relatively thin, the average ionization yield and average selectivity increase with the decrease of laser power simultaneously. Besides, there is a positive time delay between two laser pulses in which case the average ionization yield of target isotope reaches its maximum value. Moreover, when the parameters of atom vapor are constant, extending the width of laser pulses as great as possible can not only increase average ionization yield and average selectivity simultaneously, but also loosen the control accuracy of time delay between laser pulses.