2000
DOI: 10.1021/jp9933471
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Nucleation, Growth, and Relaxation of Thin Films:  Metal(100) Homoepitaxial Systems

Abstract: We describe work in our laboratory that has shed new light on nucleation, growth, and relaxation processes in thin metal films. The progress comes from the synergistic and synchronous implementation of theory and experiment, which reveals surprising secrets hidden a very simple model system. Disciplines Mathematics | Physical Chemistry CommentsReprinted (adapted) ReceiVed: September 20, 1999; In Final Form: NoVember 19, 1999 We describe work in our laboratory that has shed new light on nucleation, growth, … Show more

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Cited by 41 publications
(45 citation statements)
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“…Moreover, BCS values are also compared to experimental results [16,54,69,[71][72][73][74][75][76][77][78], as well as barriers obtained from our nudged-elasticband (NEB) calculations using an embedded atom method interatomic potential [79]. Activation barriers for selected processes are listed in Table I.…”
Section: Theory and Computational Detailsmentioning
confidence: 99%
“…Moreover, BCS values are also compared to experimental results [16,54,69,[71][72][73][74][75][76][77][78], as well as barriers obtained from our nudged-elasticband (NEB) calculations using an embedded atom method interatomic potential [79]. Activation barriers for selected processes are listed in Table I.…”
Section: Theory and Computational Detailsmentioning
confidence: 99%
“…These low-barrier processes consist of diffusion from the low coordination sites that are created as a result of the RDF deposition dynamics. Our motivation for this model comes from consideration of the Ag/Ag͑100͒ system, where the barrier for diffusion across ͕100͖ terraces equals E d (100) Ϸ0.4 eV, 23 so this process is inactive below about 130 K. However, the barrier for diffusion across ͕111͖ micofacets of E d (111) Ϸ0.1 eV ͑Ref. 24͒ is much lower, leading to activation of this process around 40 K. Atoms landing on the side of pyramidal microprotrusions are, in actuality, landing on ͕111͖ facets, so their diffusion leads to interlayer transport potentially smoothing the film above 40 K. In the rest of this section, we present results of the kinetic Monte Carlo ͑KMC͒ simulations, in which we incorporate certain low-barrier diffusion processes into our previously described RDF models in 1ϩ1d and 2ϩ1d.…”
Section: Growth At Low Temperatures: Low-barrier Interlayer Diffumentioning
confidence: 99%
“…This has been shown by the large body of work on crystalline substrates and films. 18 For this purpose, scanning tunneling microscopy ͑STM͒ provides invaluable detailed insight. This is because the spatial characteristics of films at low coverages, such as the island density, reflect the kinetics of nonequilibrium adlayer evolution during deposition.…”
Section: Introductionmentioning
confidence: 99%