Abstract:The Rutherford backscattering and particle-induced X-ray emission methods are used to study the surface layers in gold-silicon structures, the parameters of which govern the operational characteristics of electron devices constructed on their basis. The measurements are performed on a high-precision micro-analytical unit "Nuclear scanning probe" recently put into operation at the "Spectrum" laboratory. The thicknesses of a gold layer sputtered onto the specimen surface were about 17 and 20 nm for two different… Show more
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