NSOM-based characterization method applicable to optical channel waveguide with a solid-state cladding

Ji, Wonsoo; Kim, Dae-Chan; Kim, Hyun Jun; Beom‐Hoan, O; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol

doi:10.1109/lpt.2005.844004

Cited by 7 publications

(1 citation statement)

References 7 publications

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“…The near-field scanning optical microscope (NSOM) is a high resolution imaging tool used in measuring both the surface profile and the near-field optical signal of a sample, and thus has been widely used in such research fields as the measurement of micro/nanophotonic devices, [1][2][3][4][5][6][7] plasmonic devices, 8,9 semiconductor devices, [10][11][12] and biomaterials, [13][14][15][16] etc. In addition, it plays an important role in the field of nanolithography.…”

Section: Introductionmentioning

confidence: 99%

Sensitivity maximized near-field scanning optical microscope with dithering sample stage

Park

Lee

Heo

et al. 2012

Review of Scientific Instruments

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We developed a new scheme for a higher sensitivity near-field scanning optical microscope (NSOM) by using a dithering sample stage rather than a dithering probe for the constant gap control between probe and sample. In a conventional NSOM, which use tip dithering feedback mechanism, the Q factor drastically decreases from 7783 to 1000 (13%) or even to 100 (1%) because harmonic oscillating characteristic is deteriorated owing to the large change of stiffness and mass of one prong of tuning fork when a probe is attached to it. In our proposed scheme, on the other hand, we use sample dithering feedback mechanism, where the probe is not attached to the tuning fork and the sample is loaded directly onto the surface of dithering tuning fork. Thus, the Q factor does not decrease significantly, from only 7783 to 7480 (96%), because the loaded sample hardly changes the stiffness and mass of tuning fork. Accordingly, gap control between the immobile fiber probe and the dithering sample is performed precisely by detecting the shear force with high sensitivity. Consequently, the extremely high Q factor enables clear observation of graphene sheets with sub-nanometer vertical resolution, which is not possible with a conventional NSOM setup.

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Section: Introductionmentioning

confidence: 99%

Sensitivity maximized near-field scanning optical microscope with dithering sample stage

Park

Lee

Heo

et al. 2012

Review of Scientific Instruments

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Fabrication and integration of VLSI micro/nano-photonic circuit board

Lee

Park

et al. 2006

Microelectronic Engineering

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Characterization of a 90° waveguide bend using near-field scanning optical microscopy

Yuan

Lear

Stephens

et al. 2005

Applied Physics Letters

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Multiple modes are directly imaged in a silicon nitride waveguide bend using near-field scanning optical microscopy. Since the high order mode attenuates faster than the fundamental mode, a transient interference is observed. Local loss at the bend-to-straight waveguide interface is found and attributed to modal mismatch. The observations are in good agreement with modal calculations using conformal index transformation.

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NSOM-based characterization method applicable to optical channel waveguide with a solid-state cladding

Cited by 7 publications

References 7 publications

Sensitivity maximized near-field scanning optical microscope with dithering sample stage

Sensitivity maximized near-field scanning optical microscope with dithering sample stage

Fabrication and integration of VLSI micro/nano-photonic circuit board

Characterization of a 90° waveguide bend using near-field scanning optical microscopy

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