Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography

Lee, Jai-Hyong; Ahn, Kwang‐Duk; Cho, Iwhan

doi:10.1016/s0032-3861(00)00559-0

Cited by 10 publications

(5 citation statements)

References 13 publications

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“…This latter disappointing property, attributed to the linear, low C/H ratio polymer architecture, was only slightly improved through incorporation of pendant carbon-rich moieties, though significant advances have been reported recently 5f 1 Some of the existing polymeric platforms for 193 nm resist formulations. − …”

Section: Introductionmentioning

confidence: 99%

Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

2001

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A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and characterized. These novel materials that provide both optical transparency at 193 nm and also reactive ion etch resistance are obtained via cyclopolymerization of suitably designed bifunctional monomers incorporating acrylic and olefinic double bonds. The approach is highly versatile and allows the preparation of a broad array of structurally related materials with different substituents providing the imaging function and the desired level of etch resistance. The cyclopolymerization process is experimentally forgiving, enabling control of the molecular weight as well as the incorporation of comonomers such as acrylic acid or maleic anhydride to fine-tune the lithographic properties.

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Section: Introductionmentioning

confidence: 99%

Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

2001

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“…These [Pd(RCN) 4‐n L n ] 2+ WCA complexes were successfully applied for the VAP of diverse norbornene‐type monomers: 1.1 , [59h] 1.3 , [62] 1.6‐1.8 , [59b,c,h] 1.9 , [59b,h] 1.10 , [59h] 1.11 , [59h] 1.12 , [59h,64] 1.15 , 1.16 , [65] 5‐norbornenyl‐2‐methanol esters ( 3.7 a‐3.7 h ), [59e–g,66] 3.10 a , 3.10 b , 3.10 d , [44j,58,67] 3.12 , and related tetracyclic monomers [68] . Although [Pd(RCN) 4‐n L n ] 2+ WCA can produce high‐molecular‐weight products from NB , 5‐alkylnorbornenes and esters of 5‐norbornenyl‐2‐methanol, however, the formation of polymeric products with significantly lower molecular weights using these catalysts was found in the polymerization of norbornenes with two substituents ( e. g ., exo ‐1,2‐dihydrodicyclopentadiene, etc .…”

Section: Cationic Single‐component Palladium Catalysts For Polymeriza...mentioning

confidence: 99%

Single‐Component Catalysts for the Vinyl‐Addition Polymerization of Norbornene and its Derivatives

Bermesheva,

Bermeshev

2023

ChemCatChem

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Vinyl‐addition polynorbornenes are versatile templates for the targeted design of high‐performance materials for various applications, such as membrane gas separation, micro‐ and optoelectronics, fuel cells, sensors, catalyst supports, etc. The cornerstone of the syntheses of these compounds is the choice of a catalyst for polymerization. Considering valuable developments in the field of catalysts for vinyl‐addition polymerization (VAP) summarized in previously published reviews, mention should be made that the research efforts were largely focused on two‐ and three‐component catalytic systems that suffer from the need to use a cocatalyst. The aim of this review is to highlight the advances in the design and development of single‐component catalysts for the VAP of norbornenes. Such catalysts are categorized into two main groups, viz., neutral and cationic catalysts. The catalyst structure, the catalytic activity, and the molecular weight characteristics of polymers produced on these catalysts are considered in detail. We believe this article can serve as a guide for developing future catalysts to gain access to new functional materials.

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“…It also has a decisive impact on photoresist performances . The regular photoresist resin systems include acrylic acid and acrylic esters, polycyclic olefin polymer, cyclic olefin, and maleic anhydride copolymer, vinyl ether, and maleic anhydride copolymer, polycyclic olefin ring–opening polymer, multicopolymer. Among them, acrylic esters system was widely used as it has a better resolution, sensitivity, and adsorptive property.…”

Section: Introductionmentioning

confidence: 99%

Design, synthesis, and photosensitive performance of polymethacrylate‐positive photoresist‐bearing o‐nitrobenzyl group

Guan

Zhao

et al. 2014

J of Applied Polymer Sci

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Novel polymethacrylate‐positive photoresist‐bearing o‐nitrobenzyl group was described herein. The matrix polymer (PCHIBNB) was synthesized by copolymerization of cyclohexyl methacrylate (CHMA), isobornyl methacrylate (IBMA), and o‐nitrobenzyl methacrylate (NBMA) via reversible addition fragmentation chain transfer (RAFT) polymerization method. After UV irradiation, the o‐nitrobenzyl groups of PCHIBNB were photocleaved and the resulting carboxyl groups were highly alkali‐soluble, so that the matrix polymer could be etched by mild alkali solution with no requirements of photosensitizers or photoacid generators. PCHIBNB was characterized by Fourier transform infrared spectroscopy (FTIR), proton nuclear magnetic resonance (1H‐NMR) spectroscopy, and gel permeation chromatography (GPC). The photocleavable behaviors of PCHIBNB were determined by FTIR, 1H‐NMR, thermogravimetric analysis (TGA), and differential scanning calorimetry (DSC) analysis. The resist formulated with this polymer and cast in tetrahydrofuran (THF) solution showed 10 μm × 10 μm square pattern using a mercury–xenon lamp in a contact printing mode and tetramethyl‐ammonium hydroxide aqueous solution as a developer. © 2014 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2015, 132, 41733.

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Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography

Cited by 10 publications

References 13 publications

Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

Design, Synthesis, and Characterization of Carbon-Rich Cyclopolymers for 193 nm Microlithography

Single‐Component Catalysts for the Vinyl‐Addition Polymerization of Norbornene and its Derivatives

Design, synthesis, and photosensitive performance of polymethacrylate‐positive photoresist‐bearing o‐nitrobenzyl group

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