2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference 2009
DOI: 10.1109/asmc.2009.5155944
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Novel method to generate inspection care areas using GDS

Abstract: In order to make wafer inspection more sensitive, it is necessary to create inspection care areas that better reflect the actual layout of features in each die. However, it is very time consuming and tedious to draw such care areas manually. In this work, we proposed a novel method to generate suitable care areas using GDS. Two innovative ways were developed and enabled this method to be implemented in a mass production.

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