Novel method for precise curved EUV mask CD characterization by adopting machine learning

Lee, Jaeseo; Noh, Inhwan; Sung, Youngsu; Kim, Heebom; Kang, Ji-hoon; Kim, Seunghye; Choi, Jin

doi:10.1117/12.2687781

Photomask Technology 2023 2023

DOI: 10.1117/12.2687781

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Novel method for precise curved EUV mask CD characterization by adopting machine learning

Jaeseo Lee,

Inhwan Noh,

Youngsu Sung

et al.

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Novel method for precise curved EUV mask CD characterization by adopting machine learning

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References 6 publications

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