Novel method for NH-rich coatings engineering by means of aerosol assisted atmospheric pressure plasma deposition

Insights into plasma‐assisted polymerization at atmospheric pressure by spectroscopic diagnostics

“…A schematic view of the setup used in this study is shown in Figure . The plasma source consists of a single electrode corona jet (called “AlmaJET” ‐ see Figure for details) well suited for localized plasma treatment and deposition of complex 3D coatings . Ar gas flow of 2 standard liter per minute (slm) was injected in the discharge region through the primary channel; while, simultaneously, a second flow of 3 slm of Ar was introduced through the secondary gas channel in the region downstream of the high‐voltage (HV) electrode tip.…”

“…The plasma source consists of a single electrode corona jet (called "AlmaJET"see Figure 2 for details) well suited for localized plasma treatment and deposition of complex 3D coatings. [20,21] Ar gas flow of 2 standard liter per minute (slm) was injected in the discharge region through the primary channel; while, simultaneously, a second flow of 3 slm of Ar was introduced through the secondary gas channel in the F I G U R E 1 Layout of the plasma deposition setup: (1) Ar supply, (2) bubbling system, (3) digital mass flow controller, (4) plasma source, (5) intensified charge-coupled device camera, (6) synchronization unit, (7) high-voltage generator, (8) current probe, (9) voltage probe, (10) oscilloscope region downstream of the high-voltage (HV) electrode tip. The amount of precursor content, introduced in the primary channel of the system, was controlled by setting the flow of carrier gas (0.065 slm of Ar) passing through a bubbling system filled with TEOS precursor (SiO 4 C 8 H 20 , ≥99%; Sigma-Aldrich).…”

“…Even though the use of the abovementioned APPJ has already been considered by some authors for the polymerization of biocompatible amine/amide-rich coatings, the use of such a plasma source for Si-based thin films polymerization remains so far unexplored. [20] Thus, addressing the abovementioned issues, the aim of this study is twofold: (a) to study the TEOS influence on the plasma gas temperature, electron density, and spatial-temporal behavior of excited species in an Ar/TEOS APPJ; (b) to shed light on the predominant gas-phase mechanisms in the presence of heavy molecules of TEOS leading to deposition of organosilicon coatings. High-resolution spectra of the OH(A-X), N 2 (C-B), and CH(A-X) emission bands have been used for rotational temperature measurements and the conditions for which these temperatures can be assumed equal to the gas temperature (T gas ) in the case of the Ar/TEOS mixture are discussed.…”

“…The OES technique is combined in this study with the polydiagnostics of an APPJ for the deposition of Si‐based thin films by using an Ar/TEOS mixture. Even though the use of the abovementioned APPJ has already been considered by some authors for the polymerization of biocompatible amine/amide‐rich coatings, the use of such a plasma source for Si‐based thin films polymerization remains so far unexplored . Thus, addressing the abovementioned issues, the aim of this study is twofold: (a) to study the TEOS influence on the plasma gas temperature, electron density, and spatial–temporal behavior of excited species in an Ar/TEOS APPJ; (b) to shed light on the predominant gas‐phase mechanisms in the presence of heavy molecules of TEOS leading to deposition of organosilicon coatings.…”

Insights into switchable thermoresponsive copolymer layers by atmospheric pressure plasma‐initiated chemical vapour deposition

“…[ 25 ] To compensate for the inherent solubility of PNVCL in water, the AP‐PiCVD reaction of NVCL with a cross‐linking monomer was investigated. Indeed, in the literature, plasma copolymerization involving unsaturated monomers, in particular monomers bearing two double carbon bonds such as N , N′ ‐methylenebisacrylamide [ 31,32 ] or ethylene glycol dimethacrylate, [ 33,34 ] is reported to improve film stability in water. On the basis of the excellent water‐resistance of the polymers produced by the PiCVD of 1,3,5‐trivinyl‐1,3,5‐trimethylcyclotrisiloxane (V3D3), [ 35 ] the copolymerisation of NVCL and V3D3 was firstly investigated.…”