“…To minimize defect formation, substrates with a similar crystal structure and lattice constants as well as thermal expansion coefficient are chosen. 1 Several methods have been used to achieve epitaxial growth of film, including molecular beam epitaxy, 2 chemical vapor deposition, 3 chemical bath deposition, 4,5 underpotential electrodeposition, 6,7 and overpotential electrodeposition. [8][9][10] Compared to vacuum vapor depositions, electrodeposition is a simple, cost-effective, scaleable, and fast wet process which allows precise control of the composition, crystallographic structure, texture and grain size.…”