2014
DOI: 10.1016/j.jorganchem.2013.11.018
|View full text |Cite
|
Sign up to set email alerts
|

Novel formation of silicon–germanium bond: Insertion reactions of H2SiLiF with GeH3X (X = F, Cl, Br)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
references
References 50 publications
0
0
0
Order By: Relevance