Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction
Mohamed Habib,
Hossam A. H. Fahmy,
Mohamed F. Abu-ElYazeed
Abstract:Mask optimization for optical lithography requires extensive processing to perform the Resolution Enhancement Techniques (RETs) required to transfer the design data to a working Integrated Circuits (ICs). The processing power and computational runtime for RETs tasks is ever increasing due to the continuous reduction of the feature size and the expansion of the chip area. State-of-the-art research sought Machine Learning (ML) technologies to reduce runtime and computational power, however ML-RETs are still not … Show more
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