2007
DOI: 10.2494/photopolymer.20.719
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Novel Diamantane Polymer Platform for Resist Applications

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2008
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Cited by 4 publications
(3 citation statements)
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“…A Japanese patent application disclosed the synthesis of 1‐diamantyl acrylate monomer ( Da ),48 and a preprint mentioned the synthesis of 1‐diamantyl methacrylate monomer ( Dm ) 49. Related acrylic diamantane polymers have been studied for photoresist applications,50, 51 and one recent article reports a relatively high refractive index (1.56) for a polymer of this type 52…”
Section: Introductionmentioning
confidence: 99%
“…A Japanese patent application disclosed the synthesis of 1‐diamantyl acrylate monomer ( Da ),48 and a preprint mentioned the synthesis of 1‐diamantyl methacrylate monomer ( Dm ) 49. Related acrylic diamantane polymers have been studied for photoresist applications,50, 51 and one recent article reports a relatively high refractive index (1.56) for a polymer of this type 52…”
Section: Introductionmentioning
confidence: 99%
“…Although the bromination route via the carboxylic acids leads to unequally disubstituted diamantane derivatives, these reactions either have low yields or the mixtures are hard to separate even with advanced HPLC techniques . Recently, Padmanaban et al treated diamantane-4,9-diol ( 6 , Scheme ) with equimolar amounts of reagent to obtain 4-hydroxy-9-diamantylmethacrylate, but this reaction proceeded in only 5% yield …”
mentioning
confidence: 99%
“…9 Recently, Padmanaban et al treated diamantane-4,9-diol (6, Scheme 1) with equimolar amounts of reagent to obtain 4-hydroxy-9-diamantylmethacrylate, but this reaction proceeded in only 5% yield. 10 Since it is possible to prepare the bisapical diol 6 in high yield directly from 2 using 100% nitric acid, 5 dialcohol is a readily accessible precursor for the monoprotection. Even though there are many strategies for the monoprotection of diols, such reactions often require uncommon reagents, polymers, and/or dry solvents.…”
mentioning
confidence: 99%