Mechanism of the ion track formation in crystalline silicon (c-Si) is discussed, particularly under 1–9 MeV C60 ion irradiation. In this energy region, the track formation was not expected because the energy E was much lower than the threshold of E
th = 17 MeV determined by extrapolation from higher energy data in the past literature. The track formation is different between irradiations of C60 ions and of monoatomic ions: The tracks were observed under 3 MeV C60 ion irradiation but not under 200 MeV Xe ions, while both the irradiations have the same electronic stopping (S
e) of 14 keV nm−1 but much higher nuclear stopping (S
n) for the former ions. The involvement of S
n is suggested for the C60 ions. While the inelastic thermal spike (i-TS) calculations predict that the high energy monoatomic ion irradiation forms the tracks, the tracks have never been experimentally detected, suggesting quick annihilation of the tracks by highly enhanced recrystallization in c-Si. Exceptions are C60 ions of 1–9 MeV, where the track radii are well reproduced by the i-TS theory with assuming the melting transition. Collisional damage induced by the high S
n from C60 ions obstructs the recrystallization in c-Si. Then the tracks formed by the melting transition survive against the recrystallization. This is a new type of the synergy effect between S
e and S
n, different from the already-known mechanisms, i.e., the pre-damage effect and the unified thermal spike. While c-Si was believed as a radiation-hard material in the S
e regime with high S
e threshold, this study suggests that c-Si has a low S
e threshold but with efficient recrystallization.