1869
DOI: 10.1002/prac.18691080116
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“…Year Development Authors 1850 ± 1890 migration of Fe 2 O 3 in a HCl flow Bunsen [1] ªartificial formation of mineralsº Saint-Claire Deville [2] transport of Si and Al via the subchlorides with the addition of gaseous SiCl 4 or AlCl 3 Troost, Hautefeuille [3,4] industrial purification of Ni by vaporization as Ni(CO) 4 and decomposition at a slightly higher temperature Mond, Langer [5] 1925 ± 1930 vaporization of metals with iodine and decomposition of the iodides over a glowing wire van Arkel, De Boer [6,7] transport of Au with Cl 2 Biltz, Fischer, Juza [8] from 1950 wide-ranging investigation into fundamentals and many systems, review (up to 1962) [9] publication list up to 1987 [10] H. Schäfer from 1960 chalcogenides R. Nitsche [11,12] from 1965 thermochemistry of transport; quantitative treatment of the deposition of compounds with a homogeneity range, crystal growth (also under zero gravity) and A s will be formed at the required position by appropriate adjustment of the pressure and temperature. This procedure, which is referred to as chemical vapor deposition (CVD), is used in many variations for technical purposes.…”
Section: Reginald Gruehn* and Robert Glaummentioning
confidence: 99%
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“…Year Development Authors 1850 ± 1890 migration of Fe 2 O 3 in a HCl flow Bunsen [1] ªartificial formation of mineralsº Saint-Claire Deville [2] transport of Si and Al via the subchlorides with the addition of gaseous SiCl 4 or AlCl 3 Troost, Hautefeuille [3,4] industrial purification of Ni by vaporization as Ni(CO) 4 and decomposition at a slightly higher temperature Mond, Langer [5] 1925 ± 1930 vaporization of metals with iodine and decomposition of the iodides over a glowing wire van Arkel, De Boer [6,7] transport of Au with Cl 2 Biltz, Fischer, Juza [8] from 1950 wide-ranging investigation into fundamentals and many systems, review (up to 1962) [9] publication list up to 1987 [10] H. Schäfer from 1960 chalcogenides R. Nitsche [11,12] from 1965 thermochemistry of transport; quantitative treatment of the deposition of compounds with a homogeneity range, crystal growth (also under zero gravity) and A s will be formed at the required position by appropriate adjustment of the pressure and temperature. This procedure, which is referred to as chemical vapor deposition (CVD), is used in many variations for technical purposes.…”
Section: Reginald Gruehn* and Robert Glaummentioning
confidence: 99%
“…(42)], which involves a ªdouble transformationº and a redox reaction. The chlorine then acts as the true TA for NiSO 4 …”
Section: Sulfatesmentioning
confidence: 99%