2011
DOI: 10.1063/1.3595678
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Note: Laser ablation technique for electrically contacting a buried implant layer in single crystal diamond

Abstract: The creation of thin, buried, and electrically conducting layers within an otherwise insulating diamond by annealed ion implantation damage is well known. Establishing facile electrical contact to the shallow buried layer has been an unmet challenge. We demonstrate a new method, based on laser micro-machining (laser ablation), to make reliable electrical contact to a buried implant layer in diamond. Comparison is made to focused ion beam milling.

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Cited by 4 publications
(3 citation statements)
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“…15 This region can be etched by boiling the diamond in an oxidizing acid solution or in an O 2 plasma environment. This approach has been used to lift off thin diamond layers and can be useful in ion beam patterning and machining of diamond [7]. The damaged layer after implantation and annealing apart from having graphitic carbon, also has amorphous carbon in the sp n form where 20 n=1,2,3.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…15 This region can be etched by boiling the diamond in an oxidizing acid solution or in an O 2 plasma environment. This approach has been used to lift off thin diamond layers and can be useful in ion beam patterning and machining of diamond [7]. The damaged layer after implantation and annealing apart from having graphitic carbon, also has amorphous carbon in the sp n form where 20 n=1,2,3.…”
Section: Accepted Manuscriptmentioning
confidence: 99%
“…The possibility of creating buried conductive structures in the diamond bulk with MeV ion implantation has not been extensively studied, particularly because it poses the challenge of developing a suitable strategy to implement their electrical connection with the sample surface at specific locations. Different methods have been explored to address this issue, such as laserinduced graphitization [39], high-voltage-induced thermal breakdown [40], multiple energy ion implantation [34] and laser ablation [41]. In a preliminary study [42], we proposed the use of 3D masks to modulate the penetration of MeV ions in diamond, thus allowing the direct ; the total number of vacancies per ion is 46, 47 and 52 for the three ion energies, respectively; the end-of-range damage peaks are clearly visible for all ion energies.…”
Section: Introductionmentioning
confidence: 99%
“…The interposition of a diamond-like-carbon layer [6] has been also tested. Besides the above-mentioned techniques to obtain ohmic contacts, the ion-beam-induced graphitization of diamond has been extensively investigated [7,8] as well as laser-induced graphitization [9,10]. The advantages of these approaches consist in the possibility of obtaining conductive electrodes in an all-carbon environment, in the high thermal stability of the final structures, and in the possibility of defining contacts and electrodes into high-purity substrates without involving growth stages or complex lithographic processes.…”
Section: Introductionmentioning
confidence: 99%