Nonswitching van der Pauw technique using two different modulating frequencies

Kim, G. T.; Park, J. G.; Park, Y. W.; Müller-Schwanneke, C.; Wagenhals, M.; Roth, S.

doi:10.1063/1.1149738

Cited by 12 publications

(2 citation statements)

References 3 publications

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“…The sheet resistance of the films is measured by using van der Pauw technique 40,41 which is shown schematically in Fig 12. Here the resistances R 1 and R 2 are measured in two perpendicular directions as shown and the sheet resistance R S can be found using the formula…”

Section: Measurement Of Change In Electrical Sheet Resistancementioning

confidence: 99%

Localized subsurface modification of materials using micro-low-energy multiple ion beamlets

Chowdhury

Bhattacharjee

2011

AIP Advances

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Generation of focused multiple ion beamlets from an intense microwave plasma source is investigated for the creation of localized subsurface modification of materials. Unlike conventional single element focused ion beam (FIB) systems, the plasma source is capable of providing ion beams of multiple elements. Two types of plasma electrodes (PE) are employed, one with a honeycomb structure with notched apertures and another with a 5×5 array of through apertures, both attached to the plasma source and are capable of generating focused ion beamlets (50 - 100 μm diameter) in a patterned manner. Measurements of ion saturation current near the PE indicate that the plasma is uniform over an area of ∼ 7 cm2, which is further confirmed by uniformity in extracted beam current through the apertures. The ion beams are applied to investigate change in electrical sheet resistance Rs of metallic thin films in a controlled manner by varying the ionic species and beam energy. Results indicate a remarkable increase in Rs with beam energy (∼ 50 % at 1 keV for Ar ions), and with ionic species (∼ 90% for Krypton ions at 0.6 keV), when 80 nm thick copper films are irradiated by ∼2 cm diameter ion beams. Ion induced surface roughness is considered as the main mechanism for this change as confirmed by atomic force microscopy (AFM) measurements. Predictions for micro-beamlet induced change in Rs are discussed. The experimental results are verified using TRIM and AXCEL-INP simulations

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Section: Measurement Of Change In Electrical Sheet Resistancementioning

confidence: 99%

Localized subsurface modification of materials using micro-low-energy multiple ion beamlets

Chowdhury

Bhattacharjee

2011

AIP Advances

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“…AC techniques such as the double-AC Hall measurement [3][4][5][6][7][8][9][10] or other two-frequency techniques [11] can extract the figurative needle as efficiently as a magnet can extract the literal one. However, both techniques are more difficult to implement than DC techniques, plus the double-AC technique does not allow for simultaneous measurement of both resistivity and the Hall effect, and neither of the two AC methods allows for the collection of the additional inhomogeneity data that the van der Pauw technique provides.…”

mentioning

confidence: 99%

Polynomial-interpolation algorithm for van der Pauw Hall measurement in a metal hydride film

Koon

Ares

Leardini

et al. 2008

Meas. Sci. Technol.

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We apply a four-term polynomial-interpolation extension of the van der Pauw Hall measurement technique to a 330 nm Mg–Pd bilayer during both absorption and desorption of hydrogen at room temperature. We show that standard versions of the van der Pauw DC Hall measurement technique produce an error of over 100% due to a drifting offset signal and can lead to unphysical interpretations of the physical processes occurring in this film. The four-term technique effectively removes this source of error, even when the offset signal is drifting by an amount larger than the Hall signal in the time interval between successive measurements. This technique can be used to increase the resolution of transport studies of any material in which the resistivity is rapidly changing, particularly when the material is changing from metallic to insulating behavior.

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Simultaneous dual-configuration van der Pauw measurements of gated graphene devices

Pantleon,

Sousa,

Jensen

et al. 2024

Measurement

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Nonswitching van der Pauw technique using two different modulating frequencies

Cited by 12 publications

References 3 publications

Localized subsurface modification of materials using micro-low-energy multiple ion beamlets

Localized subsurface modification of materials using micro-low-energy multiple ion beamlets

Polynomial-interpolation algorithm for van der Pauw Hall measurement in a metal hydride film

Simultaneous dual-configuration van der Pauw measurements of gated graphene devices

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