Nonlinear Raman Effects Enhanced by Surface Plasmon Excitation in Planar Refractory Nanoantennas

Kharintsev, Sergey S.; Kharitonov, A. V.; Saikin, Semion K.; Алексеев, А. В.; Kazarian, Sergei G.

doi:10.1021/acs.nanolett.7b02252

Cited by 28 publications

(28 citation statements)

References 35 publications

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“…It is much more cost-effective, mechanically and thermally robust, and, importantly, compatible with the CMOS technology despite worse optical properties. Successful implementation of the titanium nitride as a plasmonic component in photonic devices has been demonstrated on the example of hyperbolic metamaterials working in the visible and infrared ranges [9,10], high-temperature-stable and irradiation-resistant broadband absorber [11], nanoantennas, or other nanostructures able to increase optical response [12][13][14][15][16][17], SERS (Surface-Enhanced Raman Spectroscopy spectroscopy) substrate [18], and remote optical temperature sensor [19]. Apart from applications, the current literature addresses issues related to optimizing the plasmonic properties [20][21][22][23][24][25][26] and the stability of the thin films [26][27][28].…”

Section: Introductionmentioning

confidence: 99%

Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range

et al. 2021

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Titanium nitride is a well-known conductive ceramic material that has recently experienced resumed attention because of its plasmonic properties comparable to metallic gold and silver. Thus, TiN is an attractive alternative for modern and future photonic applications that require compatibility with the Complementary Metal-Oxide-Semiconductor (CMOS) technology or improved resistance to temperatures or radiation. This work demonstrates that polycrystalline TiNx films sputtered on silicon at room temperature can exhibit plasmonic properties continuously from 400 nm up to 30 μm. The films’ composition, expressed as nitrogen to titanium ratio x and determined in the Secondary Ion Mass Spectroscopy (SIMS) experiment to be in the range of 0.84 to 1.21, is essential for optimizing the plasmonic properties. In the visible range, the dielectric function renders the interband optical transitions. For wavelengths longer than 800 nm, the optical properties of TiNx are well described by the Drude model modified by an additional Lorentz term, which has to be included for part of the samples. The ab initio calculations support the experimental results both in the visible and infra-red ranges; particularly, the existence of a very low energy optical transition is predicted. Some other minor features in the dielectric function observed for the longest wavelengths are suspected to be of phonon origin.

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Section: Introductionmentioning

confidence: 99%

Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range

et al. 2021

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“…Near-field concepts can be exploited for IR nanoscale studies with various kinds of measurement geometries. [37][38][39][40][41][42][43][44][45][46][47] The availability of brilliant IR radiation sources enabled new breakthroughs in IR instrumentation towards modern near-field microscopy. In addition, laser laboratory sources such as pulsed optical parametric oscillators (OPO) and pulsed laser sources, in particular tunable free-electron lasers (FEL), 57,65,66 were important to push the development.…”

Section: Introductionmentioning

confidence: 99%

“…14,16,22 For the analysis of such anisotropic material properties on the nanoscale, powerful characterization methods such as polarization-dependent techniques have to be selected and further developed. 15,18,19,21,22,25,26,35–43 Infrared (IR) methods are in particular attractive as material and structural properties can be determined with high sensitivity and spectral contrast in a label-free manner. 35,44 Infrared spectroscopy is complementary to other surface science techniques and has the advantage that it is compatible with a wide range of environmental conditions.…”

Section: Introductionmentioning

confidence: 99%

Polarization-Dependent Atomic Force Microscopy–Infrared Spectroscopy (AFM-IR): Infrared Nanopolarimetric Analysis of Structure and Anisotropy of Thin Films and Surfaces

Hinrichs

Shaykhutdinov

2018

Appl Spectrosc

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Infrared techniques enable nondestructive and label-free studies of thin films with high chemical and structural contrast. In this work, we review recent progress and perspectives in the nanoscale analysis of anisotropic materials using an extended version of the atomic force microscopy-infrared (AFM-IR) technique. This advanced photothermal technique, includes polarization control of the incoming light and bridges the gap in IR spectroscopic analysis of local anisotropic material properties. Such local anisotropy occurs in a wide range of materials during molecular nucleation, aggregation, and crystallization processes. However, analysis of the anisotropy in morphology and structure can be experimentally and theoretically demanding as it is related to order and disorder processes in ranges from nanoscopic to macroscopic length scales, depending on preparation and environmental conditions. In this context IR techniques can significantly assist as IR spectra can be interpreted in the framework of optical models and numerical calculations with respect to both, the present chemical conditions as well as the micro- and nanostructure. With these extraordinary analytic possibilities, the advanced AFM-IR approach is an essential puzzle piece in direction to connect nanoscale and macroscale anisotropic thin film properties experimentally. In this review, we highlight the analytic possibilities of AFM-IR for studies on nanoscale anisotropy with a set of examples for polymer, plasmonic, and polaritonic films, as well as aggregates of large molecules and proteins.

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“…For a 632.8 nm laser, the wavelengths of SPPs excited at the Au-air (𝜆 SPP Au-air ) and Au-SiO 2 interfaces (𝜆 SPP Au-SiO2 ) are derived to be 603 and 388 nm, respectively. [13,28] SPP Au-air and SPP Au-SiO2 (i.e., SPP PM-air and SPP PM-D -1) can interfere predominantly within the hexagonal air and SiO 2 wall cavities besieged by Au sidewalls via Fabry-Pérot (FP) resonance-like multiple reflections, respectively, as illustrated in Figure 1a; and Figure S1 of the Supporting Information. When the Au layer is thin (say, several nanometers only 20 ) enough, both SPP Au-air and SPP Au-SiO2 waves could transmit the Au layer into the SiO 2 and air cavities to be reflected by the opposite Au sidewalls, respectively, as shown in Figure 1.…”

Section: Resultsmentioning

confidence: 99%

Dielectric Walls/Layers Modulated 3D Periodically Structured SERS Chips: Design, Batch Fabrication, and Applications

Tian

Chen

et al. 2022

Advanced Science

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As an indispensable constituent of plasmonic materials/dielectrics for surface enhanced Raman scattering (SERS) effects, dielectrics play a key role in excitation and transmission of surface plasmons which however remain more elusive relative to plasmonic materials. Herein, different roles of vertical dielectric walls, and horizontal and vertical dielectric layers in SERS via 3D periodic plasmonic materials/dielectrics structures are studied. Surface plasmon polariton (SPP) interferences can be maximized within dielectric walls besieged by plasmonic layers at the wall thicknesses of integral multiple half-SPP plasmonic material-dielectric -wavelength which effectively excites localized surface plasmon resonance to improve SERS effects by one order of magnitude compared to roughness and/or nanogaps only. The introduction of extra Au nanoparticles on thin dielectric layers can further enhance SERS effects only slightly. Thus, the designed Au/SiO 2 based SERS chips show an enhancement factor of 8.9 × 10 10 , 265 times higher relative to the chips with far thinner SiO 2 walls. As many as 1200 chips are batch fabricated for a 4 in wafer using cost-effective nanoimprint lithography which can detect trace Hg ions as low as 1 ppt. This study demonstrates a complete generalized platform from design to low-cost batch-fabrication to applications for novel high performance SERS chips of any plasmonic materials/dielectrics.

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Nonlinear Raman Effects Enhanced by Surface Plasmon Excitation in Planar Refractory Nanoantennas

Cited by 28 publications

References 35 publications

Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range

Titanium Nitride as a Plasmonic Material from Near-Ultraviolet to Very-Long-Wavelength Infrared Range

Polarization-Dependent Atomic Force Microscopy–Infrared Spectroscopy (AFM-IR): Infrared Nanopolarimetric Analysis of Structure and Anisotropy of Thin Films and Surfaces

Dielectric Walls/Layers Modulated 3D Periodically Structured SERS Chips: Design, Batch Fabrication, and Applications

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