Nonlinear photoresists for maskless photolithography on the basis of Ag-doped As2S3 glassy films

Abstract

Inorganic chalcogenide photoresists are widely used in microelectronics and optoelectronics. Here, we describe strongly nonlinear chalcogenide photoresists fabricated on the basis of Ag-doped As2S3 glassy films. Photoresists are prepared by vacuum coevaporation of As2S3 bulk glass and Ag. Superlinear dissolution characteristics of Ag-doped photoresists are explained in the framework of the so-called “percolation approach.” The advantages of superlinear photoresists for maskless photolithography are briefly discussed.

A review on metal-doped chalcogenide films and their effect on various optoelectronic properties for different applications

“…Ag-doped in As 2 S 3 film is used to fabricate strongly nonlinear chalcogenide photoresists, and useful for massless photolithography. 142 Application-based nanometer dimension pattern lines have been developed through doping Ag in chalcogenide materials. The structure of these Ag-doped lines is similar to that of the accelerating voltage beam parameters.…”

Transition of reversible photodarkening to photobleaching in chalcogenide films

“…The so-called giant photoexpansion (PE) ∼ 5% induced in As 2 S 3 by sub-bandgap illumination [1,2] has been utilized as microlenses [3] and the giant PI anisotropic deformations in sub-mm scale, discovered recently in As 2 S 3 flakes, may lead to new optical applications [4]. The large increase of photostructural transformations found on short intense pulse light excitation [5] and the super-linear photostructural sensitivity [6] have been proposed for high-resolution resists and micro-optics applications [5,6].…”

Chalcogenide glassy photoresists: History of development, properties, and applications

“…Recently, a new ChGP was developed using vacuum coevaporation of As 2 S 3 -containing glass and Ag [39,40]. These photoresists were shown to have superlinear dissolution characteristics.…”