“…Reduced or eliminated surface reflection over a broad spectrum is vital for a variety of key applications, including solar energy absorption and conversion, artificial blackbodies, photodetectors, stray light shields, infrared imaging, stealth, and space-borne optics. , It is also the primary goal of ongoing research into various antireflection strategies, such as the shift from traditional quarter-wavelength single-layer antireflection films to multi-layer film stacks, , the shift from directly moth-eye mimics to porous or nanowire-based dielectric structures for gradient refractive index, − and the shift from single-scale metallic micro- or nanostructures to macro–micro–nano hi-tech structures. − Furthermore, numerous novel optical antireflection fabrication techniques are under development, − such as physical or chemical fabrication of masked or direct methods for wavelength-ordered one- (1D), two- (2D), and three-dimensional (3D) structures. − Mask-less direct methods, such as laser and ion beam writing techniques, on the other hand, are faster and have a wider range of applications …”