1999
DOI: 10.1021/jp992030y
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Nonequilibrium Pattern Formation in Langmuir-Phase Assisted Assembly of Alkylsiloxane Monolayers

Abstract: Prepolymerized n-octadecyltrichlorosilane (OTS) monolayers were deposited onto oxidized silicon substrates from precursor Langmuir monolayers (at an air−water interface) in two-dimensional liquid expanded (LE), liquid condensed (LC), or mixed (LE/LC coexistence phase) states at four different pulling rates. Morphologies of the transferred monolayers have been investigated using atomic force microscopy (AFM). The OTS monolayers formed from the LE phase precursor reveal an incipient condensation transition exhib… Show more

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Cited by 17 publications
(12 citation statements)
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“…Striped domains in the millimeter range can be created using screen printing technology 4 or printed circuit board technology. 5 In order to obtain stripes with a width in the micrometer range, one may use elastomer stamps, [6][7][8][9][10] vapor deposition through grids, 2 photolithography of amphiphilic monolayers, 11 domain formation in Langmuir-Blodgett monolayers, 12,13 electrophoretic assembly of colloids, 14 or anisotropic rupture of polymer films. 15 Finally, stripes in the nanometer range could be produced using lithography with colloid monolayers, 16 atomic beams modulated by light masks, 17 microphase separation in diblock copolymer films, 18 or local oxidation of silicon surfaces induced by atomic force microscopy.…”
Section: Introductionmentioning
confidence: 99%
“…Striped domains in the millimeter range can be created using screen printing technology 4 or printed circuit board technology. 5 In order to obtain stripes with a width in the micrometer range, one may use elastomer stamps, [6][7][8][9][10] vapor deposition through grids, 2 photolithography of amphiphilic monolayers, 11 domain formation in Langmuir-Blodgett monolayers, 12,13 electrophoretic assembly of colloids, 14 or anisotropic rupture of polymer films. 15 Finally, stripes in the nanometer range could be produced using lithography with colloid monolayers, 16 atomic beams modulated by light masks, 17 microphase separation in diblock copolymer films, 18 or local oxidation of silicon surfaces induced by atomic force microscopy.…”
Section: Introductionmentioning
confidence: 99%
“…In the context of the emerging technology of microscale processing the use of surface substrates with micropatterns has become increasingly important for microfluidics applications. Chemically structured surfaces that exhibit lateral patterns of varying wettability can be produced by techniques such as photolithography 1,2 , microcontact printing [3][4][5] , vapor deposition through grids 6 , domain formation in Langmuir-Blodgett monolayers 7,8 , electrophoretic colloid assembly 9 , lithography with colloid monolayers 10 , microphase separation in diblock copolymer films 11 , etc. For patterned surfaces in the micrometer range, on which liquid droplets or thin liquid films are adsorbed, fascinating wetting morphologies have been predicted [12][13][14][15][16][17][18][19] (including "morphological wetting transitions" 12,16,17 ) and observed 6 .…”
Section: Introductionmentioning
confidence: 99%
“…An outline of the system is summarized in Figure 2. It is a very early example of the SAM/LB combination done in the middle of 1980s, and this cencept is currently widely used by many researchers 34–50…”
Section: Introductionmentioning
confidence: 99%
“…Matsumoto and colleageus studied similar phase separation structure and component exchange 50. Wang and colleagues reported that formation in a Langmuir monolayer of alkylsilane formed a nonequilibrium pattern of ring‐in‐a‐ring morphology in its liquid expanded phase 45. Knobler and colleagues reported phase‐separated, two‐component self‐assembled organosilane monolayers and their use in selective adsorption of a protein 40.…”
Section: Introductionmentioning
confidence: 99%