2008
DOI: 10.1063/1.2999590
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Non-ohmic contact resistance and field-effect mobility in nanocrystalline silicon thin film transistors

Abstract: Contact resistance has a significant impact on the electrical characteristics of thin film transistors. It limits their maximum on-current and affects their subsequent behavior with bias. This distorts the extracted device parameters, in particular, the field-effect mobility. This letter presents a method capable of accounting for both the non-ohmic (nonlinear) and ohmic (linear) contact resistance effects solely based upon terminal I-V measurements. Applying our analysis to a nanocrystalline silicon thin film… Show more

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Cited by 19 publications
(12 citation statements)
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References 8 publications
(3 reference statements)
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“…Overall, we notice a significant progress since the first device reported by LeComber et al [11] and the present values are amongst the highest found in the literature for a-Si:H [73][74][75][76][77][78][79] or nanostructured silicon TFTs [80][81][82]. The improvement observed on the TFTs performance is mainly related to two factors: lower growth rate used and the reduced hydrogen bombardment at the growing surface, which reduce defects.…”
Section: Thin Film Transistorssupporting
confidence: 62%
“…Overall, we notice a significant progress since the first device reported by LeComber et al [11] and the present values are amongst the highest found in the literature for a-Si:H [73][74][75][76][77][78][79] or nanostructured silicon TFTs [80][81][82]. The improvement observed on the TFTs performance is mainly related to two factors: lower growth rate used and the reduced hydrogen bombardment at the growing surface, which reduce defects.…”
Section: Thin Film Transistorssupporting
confidence: 62%
“…To handle and to check whether strong non‐linearities are present, it is possible to take advantage of the operator $\left[{{{{\delta F\left(x \right)}}\over{{\delta x}}} - {{{F\left(x \right)}}\over{x}}} \right] $ , which removes linear terms 188. The experimentally measured quantity of interest here is the inverse of the output characteristic V DS ( I ) in the linear region.…”
Section: Contact Resistance Extraction Methodsmentioning
confidence: 99%
“…The µ SAT , V TH , and I ON /I OFF of ZTO TTFT(Al) were 12.7 cm 2 /Vs, 5.0 V, and >10 7 , respectively. Many research groups [18][19][20] have reported that the current retarding factors existed at the metal electrode-AOS active layer interface adversely affects the properties of TTFTs. A potential barrier, which restricts electron injection from the metal electrode into the active layer, can be formed at the metal-semiconductor interface.…”
Section: Resultsmentioning
confidence: 99%
“…It is well known that a high contact resistance between the source/drain and the channel layer reduces the voltage drop across the channel, which aggravates the device performance of TFTs [18][19][20]. First, we metalized ZTO TTFTs with In to create source/drain electrodes [ZTO TTFT(In)].…”
Section: Resultsmentioning
confidence: 99%