Non-integral model-based scatterometry for single-structure OCD metrology
Wei-Hsin Chein,
Fu-Sheng Yang,
Zih-Ying Fu
et al.
Abstract:A new non-integral optical scatterometry technique has been introduced to circumvent issues with traditional methods in the critical dimension (CD) characterization of micro and nano-structures in semiconductor inspections. This method uses the high spatial coherence of the laser source, and an adjustable numerical aperture (NA) for effective beam shaping, enabling precise measurement of high-aspect-ratio structures. It incorporates a model-based approach with a virtual optical system and the Finite-Difference… Show more
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