2015
DOI: 10.1108/ssmt-04-2015-0014
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Noise sources in polymer thick-film resistors

Abstract: Purpose – The paper aims to get the knowledge about electrical properties, including noise, of modern polymer thick-film resistors (TFRs) in a wide range of temperature values, i.e. from 77 K up to room temperature. The sample resistors have been made of different combinations of resistive compositions, either ED7100 or MINICO (M2013, M2010), and conducting pastes (for contacts) Cu- or Au-based, deposited on FR-4 laminate. Design/methodology/approach … Show more

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Cited by 2 publications
(2 citation statements)
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“…For example, noise characterization is needed in order to understand the fundamental causes of the detection limit in spectroscopy [2,3], data link budgets in free-space optics, etc. In the case of biased devices (such as transistors [4,5], varistors [6], photodetectors [7][8][9][10][11][12][13] and other materials [14][15][16][17]), the noise introduced by the biasing devices is also very important because it can mask the noise generated by the devices being investigated or limit the performances of the designed instruments. Indeed, in order to perform reliable noise characterization, we need to resort to ultra-low-noise power supply units that introduce negligible noise levels compared to those generated by the device-under-test (DUT).…”
Section: Introductionmentioning
confidence: 99%
“…For example, noise characterization is needed in order to understand the fundamental causes of the detection limit in spectroscopy [2,3], data link budgets in free-space optics, etc. In the case of biased devices (such as transistors [4,5], varistors [6], photodetectors [7][8][9][10][11][12][13] and other materials [14][15][16][17]), the noise introduced by the biasing devices is also very important because it can mask the noise generated by the devices being investigated or limit the performances of the designed instruments. Indeed, in order to perform reliable noise characterization, we need to resort to ultra-low-noise power supply units that introduce negligible noise levels compared to those generated by the device-under-test (DUT).…”
Section: Introductionmentioning
confidence: 99%
“…Instrumentation for a low frequency noise measurements (LFNM) is a tool used to characterize a wide spectrum of devices [1]. It is applied in many technologies, e.g., semiconductors [2,3], microelectronic materials [4][5][6][7][8][9][10], electro-chemical devices [11], photodetectors [12][13][14][15][16][17][18], as well as other materials [19][20][21]. In this research, some special amplifiers (ultra-low noise amplifier -ULNA) are widely used.…”
Section: Introductionmentioning
confidence: 99%