We present and discuss the first noise measurements on hydrogenated amorphous silicon (a-Si:H) under nonthermal equilibrium conditions. Under steady-state illumination noise measurements are carried out for temperatures ranging from 100 to 450 K. We conclusively identify generation-recombination noise as the prevailing noise mechanism in intrinsic a-Si:H. We examine the dynamics of holes with noise spectroscopy in n-type devices that include thermal activation from the hole quasi-Fermi level, a clear Meyer-Neldel relation pointing to a temperature dependence of the hole quasi-Fermi level, and diffusion-limited transport to recombination centers at low temperatures. The variance is found to be independent of illumination intensity, indicative of a uniform distribution of defect states throughout the gap. Noise measurements further suggest that metastable defects are created close to midgap in degraded samples. Under conditions of electron injection we find that the noise becomes space-charge suppressed, similar to what has been observed in crystalline semiconductors. ͓S0163-1829͑98͒07131-8͔