Nitrogen Ion Microscopy

Abstract

The gas field ion source (GFIS) can be used to generate beams of helium, neon, hydrogen, and nitrogen ions, among others. Due to the low energy spread and the atomically small virtual source size, highly focused ion beams (FIB) can be obtained. We discuss the history of the GFIS and explain the field ionization and field evaporation process in general. Then, the unique properties of the nitrogen ionization, originating from the molecular nature, are explained. We show how the nitrogen ion microscopy (N2IM) can be used to image and pattern samples. The unique contrast observed in samples with graphene or carbon is reported. Finally, we conclude with an outlook of the technology and possible key applications such as spatially localized nitrogen-vacancy center implantation.

Theoretical investigation of the elastic scattering of ${{\rm{e}}}^{\pm }$ by the ions of nitrogen isonuclear series

“…On the other hand, understanding positron-ion collisions is one of the possible key to place constraints on the origin of positrons by determining whether the observed spatial distribution of positron emission in our Galaxy reflects the spatial distribution of positron sources [6]. The presence of nitrogen ions in the magnetosphere of Earth and Saturn [7,8], in the atmosphere [9] and their applications in nitrogen ion laser [10], nitrogen ion implantation [11] and nitrogen ion microscopy [12] makes these ions more relevant to study.…”

Comparison of Mg-based liquid metal ion sources for scalable focused-ion-implantation doping of GaN

“…Focused ion beams (FIBs) are routinely used for microand nano-electronics modification and fabrication, for example, in circuit repair, 4 in mask repair, 5,6 and, more recently, for creating optically active impurities in quantum materials. [7][8][9][10][11][12] Different techniques for generation of FIBs are available, each one with its own advantages and drawbacks.…”