Nitrogen 1s electron binding energy assignment in carbon nitride thin films with different structures

Zheng, Weitao; Xing, Kezhao; Hellgren, Niklas; Lögdlund, M.; Johansson, Anna; Gelivs, U.; Salaneck, W. R.; Sundgren, J.‐E.

doi:10.1016/s0368-2048(97)00083-2

Cited by 83 publications

(39 citation statements)

References 14 publications

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“…7. Taking into account these data and our earlier findings, we assign the N1 peak component at 398.3 eV to C=N-C type chemical environment, where the sp 2 nitrogen is bonded to two sp 2 type carbons, as in pyridine [35,[45][46]. The N2 component at 399.7 eV is assigned to sp 2 N in the pyrrole, diazine-and triazine-type ring structure [49].…”

Section: Chemical Structurementioning

confidence: 51%

“…The chemical states of the oxygen contamination, which entered accidentally during the plasma treatments, do not vary significantly, while its overall content changes, as shown in Table 1. The components at 398.3 ± 0.2 eV, 399.7 ± 0.2 eV and 400.9 ± 0.2 eV correspond to at least [11,31,35] and to carbon based macromolecular or polymeric substances [47,48]. The current controversy was broadly discussed in [36][37][38][39]49] and is also presented in Fig.…”

Section: Chemical Structurementioning

confidence: 97%

“…When these molecular ions enter the surface they are neutralized and, if their kinetic energy is higher than the dissociation energy of N 2 (9.8 eV), they also dissociate. The energy of the two nitrogen atoms is then, on average, half of the applied biasing energy [34,35]. Accordingly, at 50 V bias the appropriate input for the ion energy in the SRIM calculation is 25 eV, at 100V bias it is 50 eV, and at 200 V bias 100 eV.…”

Section: In-depth Distribution Of Nitrogenmentioning

confidence: 99%

“…We attribute the N3 type N at 400.9 eV to N substituting carbon in graphite-like environment [35,12]. These assignments are summarized in Table 2.…”

Section: Chemical Structurementioning

confidence: 99%

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Surface modification of graphene and graphite by nitrogen plasma: Determination of chemical state alterations and assignments by quantitative X-ray photoelectron spectroscopy

Bertóti

Mohai

László

2015

Carbon

181

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Multilayer graphene (MLGR) and its bulk analog, highly oriented pyrolytic graphite (HOPG), were treated by radio frequency activated low pressure N 2 gas plasma (at negative bias 0 - pyrrole-and triazine-type at 399.7 eV and N substituting C in graphite-like network at 400.9 eV) were determined from high-resolution N1s spectral region for all samples. Pyridine and pyrrole-triazine components increase preferentially with increasing bias. Alterations of the C1s and O1s spectra are discussed in a critical approach. The amount of reacted carbon was consistent with that required for the three different nitrogen and oxygen states, thus validating the proposed assignments.

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Section: Chemical Structurementioning

confidence: 51%

Section: Chemical Structurementioning

confidence: 97%

Section: In-depth Distribution Of Nitrogenmentioning

confidence: 99%

“…We attribute the N3 type N at 400.9 eV to N substituting carbon in graphite-like environment [35,12]. These assignments are summarized in Table 2.…”

Section: Chemical Structurementioning

confidence: 99%

See 2 more Smart Citations

Surface modification of graphene and graphite by nitrogen plasma: Determination of chemical state alterations and assignments by quantitative X-ray photoelectron spectroscopy

Bertóti

Mohai

László

2015

Carbon

181

View full text Add to dashboard Cite

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“…5, the same chemical states of nitrogen were detected also on the surface of SLGO, although their relative amount was somewhat different. The assignment of this peak components to certain bonding states were discussed in a large number of publications based on experimental works devoted to the synthesis of CN x type materials [16][17][18][19][20][21][22][23], N doped graphene [24,25] and nitrogen-containing DLC coatings [8,26,27]. The controversy existing in rendering N-C structures to different chemical shifts was discussed in [16][17][18][19]28].…”

Section: Chemical Structurementioning

confidence: 99%

Low pressure RF plasma modification of the surface of three different nano-carbon materials

et al. 2014

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Well-ordered nano-carbon materials, like multiwall carbon nanotubes, graphene oxide, graphene due to their unique physical and chemical properties, are candidates for promising applications.In this work thin multilayered graphene, single layer graphene oxide layers and highly oriented pyrolytic graphite (HOPG) surface were treated by RF activated N 2 gas plasma at nominally room temperature. Negative bias in the 0-200 V range and treatment time of 10 min was applied. Surface chemical alterations were followed by X-ray photoelectron spectroscopy (XPS). The applied treatments resulted in a significant build-up of nitrogen in the surface of these nano-carbon materials. The amount of nitrogen varied between 4 and 10 atomic %, depending on type of carbon and on biasing conditions. Evaluating the high-resolution N1s XP spectral region, typically three different chemical bonding states of the nitrogen were delineated. Peak component at 398.3 eV is assigned to C=N-C type, at 399.7 eV to sp 2 N in melamine-type ring structure and at 400.9 eV to N substituting carbon in a graphite-like environment. Identical chemical bonding of the nitrogen was detected on the surface of HOPG treated in the same way for comparison.

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The Effect of Substrate Temperature on the Structure and Hardness of Magnetron Sputtering Deposited Carbon Nitride Films

Zheng

Guo

Sjöström

et al. 1999

phys. stat. sol. (a)

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Carbon nitride films are deposited on Si(001) substrates by reactive dc magnetron sputtering graphite in a pure N2 discharge. The structure of carbon nitride films was probed using near edge X‐ray absorption fine structure (NEXAFS) and high resolution electron microscopy (HREM), and the hardness was evaluated using nanoindentation experiments. Both the structure and hardness for the films are affected by substrate temperature (TS). C1s NEXAFS spectra show that the intensity of π* resonance is the lowest for the film grown at TS = 350 °C, having a turbostratic‐like structure and high hardness of 60 GPa. The correlation between the structure and hardness of carbon nitride films is discussed.

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Nitrogen 1s electron binding energy assignment in carbon nitride thin films with different structures

Cited by 83 publications

References 14 publications

Surface modification of graphene and graphite by nitrogen plasma: Determination of chemical state alterations and assignments by quantitative X-ray photoelectron spectroscopy

Surface modification of graphene and graphite by nitrogen plasma: Determination of chemical state alterations and assignments by quantitative X-ray photoelectron spectroscopy

Low pressure RF plasma modification of the surface of three different nano-carbon materials

The Effect of Substrate Temperature on the Structure and Hardness of Magnetron Sputtering Deposited Carbon Nitride Films

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