Nitridosilicates‐A Significant Extension of Silicate Chemistry

Abstract

Because of its low chemical reactivity Si3N4 has hardly been used as a starting material for the preparation of multinary silicon nitrides or nitridosilicates, but has gained increasing importance as a nonoxidic material for high‐performance applications. A novel synthetic approach is presented, which starts from silicon diimide (Si(NH)2) and makes available a large variety of novel nitridosilicates. The structures of these nitridosilicates represent a significant extension from those found in the family of oxosilicates. Because of their outstanding chemical and physical stability, nitridosilicates might be of particular interest for the development of novel inorganic nitridic materials.

On the relations between the bandgap, structure and composition of the M–Si–N (M = alkali, alkaline earth or rare-earth metal) nitridosilicates

“…While the M-N bond lengths increase with increasing degree of condensation, the Si-N bond lengths tend to decrease with increasing degree of condensation, as has previously been observed by Schnick et al 12,84 This can also be observed from the data shown in Fig. 5a: the average Si-N distance is relatively large in for example Ca 4 SiN 4 (1.791 Å) with very low degree of condensation, while relatively small in SrSi 7 N 10 (1.731 Å) with a very high degree of condensation.…”

High-temperature synthesis, crystal structure, optical properties, and magnetism of the carbidonitridosilicates Ho2[Si4N6C] and Tb2[Si4N6C]

“…[9][10][11] ''Si(NH) 2 '' was obtained by ammonolysis of SiCl 4 in NH 3 (278 uC) followed by a thermal treatment at 600 uC under an atmosphere of NH 3 (see eqn. (1)).…”

Virtual crystal approximation study of nitridosilicates and oxonitridoaluminosilicates

“…[4] average value is higher than the sum of the corresponding ionic radii, due to the increased coordination of the nitrogen ion from N [2] to N [4] . This phenomenon is present in all the isotypic nitridosilicate and SiAlON compounds [3,4,19,21].…”