2011
DOI: 10.1016/j.tsf.2011.01.116
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NiTi shape memory alloy thin film micro-cantilevers array

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Cited by 7 publications
(2 citation statements)
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“…The annealing process is performed at high temperature (normally over 450°C) to form a crystalline structure of NiTi, e.g., martensite, austenite, and R-phase. The annealing is typically performed by heating an as-deposited Ni-Ti thin film in a high vacuum furnace ( Ref 11,15,16). However, there are several other possibilities for annealing such as heating by high-power laser (Ref 17), heating by halogen lamp (Ref 18), and heating in a quartz tube furnace with inert gas overflow ( Ref 12).…”
Section: Introductionmentioning
confidence: 99%
“…The annealing process is performed at high temperature (normally over 450°C) to form a crystalline structure of NiTi, e.g., martensite, austenite, and R-phase. The annealing is typically performed by heating an as-deposited Ni-Ti thin film in a high vacuum furnace ( Ref 11,15,16). However, there are several other possibilities for annealing such as heating by high-power laser (Ref 17), heating by halogen lamp (Ref 18), and heating in a quartz tube furnace with inert gas overflow ( Ref 12).…”
Section: Introductionmentioning
confidence: 99%
“…[5,6]. With the rapid development of electronic chips, micro-sensors, micro-machinery and micro-electro-mechanical systems (MEMS), it is necessary to develop the SMAs with smaller volume and outstanding properties [7][8][9]. In order to meet the above requirement, the shape memory thin films with higher functional performances have been investigated.…”
Section: Introductionmentioning
confidence: 99%