1985
DOI: 10.1063/1.95774
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Niobium nitride Josephson tunnel junctions with magnesium oxide barriers

Abstract: Niobium nitride-niobium nitride Josephson tunnel junctions have been fabricated using amorphous magnesium oxide (a-MgO) films as barriers. These junctions have excellent tunneling characteristics. For example, a large gap voltage (Vg=5.1 mV), a large product of the maximum critical current and the normal tunneling resistance (IcRn=3.25 mV), and a small subgap leakage current (Vm=45 mV, measured at 3 mV) have been obtained for a NbN/a-MgO/NbN junction. The critical current of this junction remains finite up to … Show more

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Cited by 132 publications
(26 citation statements)
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“…[9][10][11][12] Among them, only NbN/MgO/NbN junctions have exhibited good quality so far, because both NbN and MgO have the same crystal structure with a lattice mismatch of less than 5%. 8 However, the barrier height of MgO (2.8 eV) is so high that it is difficult to fabricate wellcontrolled high-J c junctions.…”
mentioning
confidence: 99%
“…[9][10][11][12] Among them, only NbN/MgO/NbN junctions have exhibited good quality so far, because both NbN and MgO have the same crystal structure with a lattice mismatch of less than 5%. 8 However, the barrier height of MgO (2.8 eV) is so high that it is difficult to fabricate wellcontrolled high-J c junctions.…”
mentioning
confidence: 99%
“…We measured circular junctions of various diameters ranging from 2 to 10µm and consistently found a critical current density of 3A/cm 2 . Large values of the gap voltage (V g = 5.7mV ) and of the I co R N product, with R N the normal state resistance, of about 5mV have been measured along with a small subgap leakage voltage (V m = 23.5mV measured at 3mV) 20 . From the magnetic field dependence of the critical current we estimated a London penetration depth (λ L ) of about 190nm meanwhile the Josephson penetration depth was λ J = 150µm.…”
mentioning
confidence: 99%
“…For NbN junctions such a thermal oxidation process is not yet established. Currently the best results are obtained by direct deposition of the barrier material 9 , and defects occur due to "missing atoms" since the barrier is comprised of merely 1 -2 atomic layers in high current density junctions 10 . In Fig.…”
mentioning
confidence: 99%