2006
DOI: 10.1134/s0036023606010050
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(NH4)2SiF6 evaporation in the presence of SiO2

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Cited by 9 publications
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“…3b. Mel'nichenko et al [17] investigated the mechanism of the solid-phase reaction between (NH 4 ) 2 SiF 6 and SiO 2 , and proposed that (NH 4 ) 2 SiF 6 could be thermally decomposed between 220 and 300 • C in the presence of SiO 2 . Generally, the following chemical reactions are expected to take place when (NH 4 ) 2 SiF 6 was heated up to 900 • C [16]:…”
Section: Characterization Of the Photonic Waste Powder (Pwp)mentioning
confidence: 99%
“…3b. Mel'nichenko et al [17] investigated the mechanism of the solid-phase reaction between (NH 4 ) 2 SiF 6 and SiO 2 , and proposed that (NH 4 ) 2 SiF 6 could be thermally decomposed between 220 and 300 • C in the presence of SiO 2 . Generally, the following chemical reactions are expected to take place when (NH 4 ) 2 SiF 6 was heated up to 900 • C [16]:…”
Section: Characterization Of the Photonic Waste Powder (Pwp)mentioning
confidence: 99%