Next-generation DUV ALTA mask patterning capabilities

Allen, Paul C.; Bohan, Michael J.; Christenson, Eric R.; Hamaker, H. C.; Howells, S.; Kenan, Boaz; Pirogovsky, Peter; Sadiq, Malik K.; Teitzel, Robin; White, Michael C.; Ungureit, Michael; Wickstrom, Alan; Kiefer, Robert; Jackson, Curt

doi:10.1117/12.570291

Cited by 2 publications

(1 citation statement)

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“…After consultation between staff members at Teledyne DALSA Semiconductor and the photomask vendor, it was decided that the critical photomasks for both the CCD described in [14] and the DESI device would be produced on a more advanced version of the laser-mask writer. A number of generations of the laser-based mask-writing systems were produced with capabilities eventually extending into the deep-UV lithography regime [18]. The decision was made to fabricate the DESI photomasks that define the pixel area on a mask writer that was about three generations more advanced than what has been used in the past.…”

Section: "Tree Rings" and Periodic-mask Errorsmentioning

confidence: 99%

CCD development for the Dark Energy Spectroscopic Instrument

et al. 2015

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We describe research and development efforts directed towards the production of 4 k × 4 k, 15 µm-pixel, fully depleted CCDs for the Dark Energy Spectroscopic Instrument (DESI). The requirements for DESI include the spectroscopic characterization of large numbers of faint galaxies at high redshift. The identification of the type and the determination of the redshift of the targeted galaxies require the use of thick, fully depleted CCDs with high quantum efficiency at near-infrared wavelengths. We describe our work to improve the CCD performance in terms of quantum efficiency and read noise. We also discuss efforts to reduce the level of image-distortion effects that have been observed on previous CCDs that are due to resistivity striations in the starting silicon and periodic errors in the photomasks used to produce the CCDs.

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Section: "Tree Rings" and Periodic-mask Errorsmentioning

confidence: 99%