New Yield-Impacting Polishing Induced Defects (PID) and A Method to Identify Them for Polished Si Substrates

Suh, Hyo Sik; Moon, Byeong-Sam; Kim, KeunSu; Kim, Jiae; Venkat, Sivakumar; Lee, Sang‐Hyun; Shen, William; Shin, Yeong-Gil; Park, Jonggeun; An, Jeong-Hoon; Seo, Scott; Park, Sung-Ki

doi:10.1149/ma2008-02/26/2012

Meet. Abstr.

2008

DOI: 10.1149/ma2008-02/26/2012

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New Yield-Impacting Polishing Induced Defects (PID) and A Method to Identify Them for Polished Si Substrates

Hyo Sik Suh¹,

Byeong-Sam Moon²,

KeunSu Kim³

et al.

Abstract: not Available.

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New Yield-Impacting Polishing Induced Defects (PID) and A Method to Identify Them for Polished Si Substrates

Abstract: not Available.

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See others like this or search for similar articles

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