2018
DOI: 10.1088/2053-1591/aab6a0
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New ultrathin film heterostructure for low-e application by sputtering technique: a theoretical and experimental study

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“…Note that a pressure of 1.8 × 10 −3 mbar equals a gas flow of 200 sccm in our deposition system. The morphological properties of this type of coatings deposited by sputtering under similar conditions have been extensively studied, and information can be found in the literature [20][21][22].…”
Section: Coatingsmentioning
confidence: 99%
“…Note that a pressure of 1.8 × 10 −3 mbar equals a gas flow of 200 sccm in our deposition system. The morphological properties of this type of coatings deposited by sputtering under similar conditions have been extensively studied, and information can be found in the literature [20][21][22].…”
Section: Coatingsmentioning
confidence: 99%