1967
DOI: 10.1049/ree.1967.0069
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New thin-film resistive memory

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1972
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Cited by 52 publications
(25 citation statements)
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“…Non-volatile memory devices based on resistive switching characteristics have been studied since the late 1960s [1]. In these devices, application of an external bias potential across an electrolyte changes the electrical conductivity of the electrolyte by changing its structure.…”
Section: Introductionmentioning
confidence: 99%
“…Non-volatile memory devices based on resistive switching characteristics have been studied since the late 1960s [1]. In these devices, application of an external bias potential across an electrolyte changes the electrical conductivity of the electrolyte by changing its structure.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, resistive switching phenomenon was discovered in amorphous silicon and silicon oxide more than 4 decades ago, and there is a revived interest in using these materials for memristors. [14][15][16][17][18][19][20][21][22][23][24][25] Although compatible with CMOS technologies regarding materials and process, the reported programming voltages for silicon oxides based devices were too high (from 3.5 to 13 V) 19,23,24 thus incompatible with the state-of-the-art lowpower CMOS transistors in electrical operation.…”
mentioning
confidence: 99%
“…Memristors, theoretically predicted in 1971 and experimentally identified in 2008, [5][6][7] possess the analog nonvolatile memory feature and have been recognized as outstanding candidates toward artificial synapses. Memristors, theoretically predicted in 1971 and experimentally identified in 2008, [5][6][7] possess the analog nonvolatile memory feature and have been recognized as outstanding candidates toward artificial synapses.…”
Section: Selective Uv-gating Organic Memtransistors With Modulable Lementioning
confidence: 99%