1990
DOI: 10.1116/1.576413
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New scanning tunneling microscopy tip for measuring surface topography

Abstract: Electron-beam deposition inside scanning electron microscope (SEM) is used to prepare a new scanning tunneling microscope (STM) tip [electron-beam deposited (EBD) tip] which has a submicron diameter and a long straight sidewall. An EBD tip as small as less than 0.1 /-lm in diameter can be formed with careful beam focusing. This EBD tip is formed to be capable of providing a low-distortion STM image of deep grooves, and is quite useful in topographic measurements of microfabricated patterns.

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Cited by 156 publications
(59 citation statements)
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“…However, these tips exhibit limited stability, due to brittleness of the fine silicon tip, and considerable tip-to-tip variations. An alternative approach taken for fabricating sharp and robust probes has involved depositing a spike of carbonaceous material onto the end of a regular pyramidal AFM probe (7,8). These amorphous carbon tips have end radii of 5-12 nm and high aspect ratios (9).…”
mentioning
confidence: 99%
“…However, these tips exhibit limited stability, due to brittleness of the fine silicon tip, and considerable tip-to-tip variations. An alternative approach taken for fabricating sharp and robust probes has involved depositing a spike of carbonaceous material onto the end of a regular pyramidal AFM probe (7,8). These amorphous carbon tips have end radii of 5-12 nm and high aspect ratios (9).…”
mentioning
confidence: 99%
“…13.8). In this technique, the focused electron beam deposits material at a selected location on the cantilever, thereby growing a tip (Akama et al, 1990), just like a stalagmite in a stalactite cavern is grown. To enable large-scale production of EBD tips, an automated technique based on pattern recognition was developed for the growth of EBD tips on whole wafers of cantilevers (Kindt et al, 2004b).…”
Section: Properties Of Small Cantileversmentioning
confidence: 99%
“…Reducing surface roughness results in a more uniform work function and less surface contamination, which helps to reduce the electrical noise from the surface [12]. Currently state-of-the-art surface processing techniques are able to reduce the surface roughness to nanometer level [21][22][23][24][25][26][27][28][29][30], but these techniques usually requires the specialized equipments of surface science, which are too complicated for most ion trap research groups.…”
Section: Introductionmentioning
confidence: 99%