New Plasma Surface Processing Technology and its Application

Abstract

Plasma surface processing technology can improve the mechanical properties, the corrosion resistance and chemical properties of the parts; therefore it has been widely used in industrial field. Advanced plasma surface processing technology is also constantly innovation, high power pulsed magnetron sputtering technique has been studied and explored by many scholars in recent years, and also gradually began to be used in the industry . This paper mainly introduces the study of HiPIMS dynamic and application over the past ten years. The HiPIMS discharge mechanism research method and theory is summarized .And the influence of the preparation process parameters about voltage, pressure, pulse width and frequency to compound film performance is systematically described, a detection method for thin film by HiPIMS is also introduced. These will provide guidance for the preparation of reactive HiPIMS.