2012
DOI: 10.1016/j.phpro.2012.02.392
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Abstract: A new Micromegas manufacturing technique, based on kapton etching technology, has been recently developed, improving the uniformity and stability of this kind of readouts. Excellent energy resolutions have been obtained, reaching 11% FWHM for the 5.9 keV photon peak of 55 Fe source and 1.8% FWHM for the 5.5 MeV alpha peak of the 241 Am source. The new detector has other advantages like its flexible structure, low material and high radio-purity. The two actual approaches of this technique will be described and…

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