New design of the variable angle infrared spectroscopic ellipsometer using double Fourier transforms

Abstract

Articles you may be interested inSynchrotron radiation-based far-infrared spectroscopic ellipsometer with full Mueller-matrix capability Rev. Sci. Instrum. 84, 023901 (2013); 10.1063/1.4789495 Development of new in situ observation system for dynamic study of lubricant molecules on metal friction surfaces by two-dimensional fast-imaging Fourier-transform infrared-attenuated total reflection spectrometer Rev. Sci. Instrum. 79, 123702 (2008); 10.1063/1.2987685 Fourier transform infrared spectroscopy for Mars science Rev. Sci. Instrum. 76, 034101 (2005); 10.1063/1.1867012 Quantitative modulated excitation Fourier transform infrared spectroscopy Rev.Development of an infrared absorption measurement method using the photothermal deflection effect of thallium bromide iodide (KRS-5): Measurement with a stepped-scan Fourier transform infrared spectrometer Rev.A new type of incidence-angle-variable infrared spectroscopic ellipsometer working in the 2100-10 000 wave number range has been designed and constructed. For the system, the analyzer and polarizer were driven by two microstepping motors having hollow shafts and rotating synchronously with a speed ratio of 2:1, i.e., Aϭ2 P. The incidence angle can be varied from 30°to 90°with an accuracy of 0.01°. The doubled Fourier transforms as both functions of the wave number and the azimuthal angles of the polarizer and analyzer were carried out and integrated in the system. Two sets of ellipsometric parameters measured in the experiment have been used to test the data self-consistency of the system. In data reduction, the error arising from the slight anisotropy of the stray light was corrected. In application, the complex dielectric function of the Au film was measured with a data accuracy better that 1% in the entire spectral range.

Sample Dependence of the Casimir Force

“…Among recent experiments let us mention the measurement of normal reflectance for evaporated gold films [31], which was performed in the wide wavelength range 0.3-50 µm, but unfortunately does not permit to evaluate independently both real and imaginary parts of the dielectric function. In contrast, the use of new ellipsometric techniques [32,33] has produced data for the real and imaginary part of the dielectric function for energy intervals 1.5-4.5 eV [34] and 1.5-3.5 eV [35].…”

Optical properties of epitaxial BiFeO3 thin film grown on SrRuO3-buffered SrTiO3 substrate

“…It is based on the measuring the change in the polarization state of a linearly polarized light reflected from a sample surface which consists of Ψ , the amplitude ratio of reflected p -polarized light to s -polarized light and Δ , the phase shift difference between the both [ 12 ]. The obtained ellipsometry spectra ( Ψ and Δ at measured wavelength range) are fitted to the optical model for thin film nanostructure, and thus, rich information including surface roughness, film thickness, and optical constants of nanomaterials are revealed [ 13 , 14 ]. Since SE allows various characterizations of the material, our group has studied some thin-film nanostructure using SE methods [ 15 - 18 ].…”

Optical Properties of Al-Doped ZnO Films in the Infrared Region and Their Absorption Applications

“…The wavelength of the incident light was within the range of 210–5000 nm. There are two measurement parameters acquired from the polarized light, i.e., amplitude ratio ( Ψ ) and phase shift ( Δ ), which were defined by the ellipsometric ratio ρ as [ 27 ]: …”