2020
DOI: 10.1109/tns.2019.2950431
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New Approach for Pulsed-Laser Testing That Mimics Heavy-Ion Charge Deposition Profiles

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Cited by 19 publications
(19 citation statements)
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“…The later technological developments of femtosecond lasers as well as near‐infrared lasers enabled to irradiate the device from the silicon substrate (i.e., the backside) by two‐photon absorption—and, consequently, to generate free carriers with a remarkable spatial resolution. [ 119–134 ] The plasma production close to the logic gates of the irradiated device implies that some of the free carriers are able to migrate through a tunnel oxide so that the logic state of the microelectronic component (e.g., flash memory, photodiode) is modified in a stable manner after irradiation.…”
Section: Self‐limited Excitation With Ultrashort Pulsesmentioning
confidence: 99%
“…The later technological developments of femtosecond lasers as well as near‐infrared lasers enabled to irradiate the device from the silicon substrate (i.e., the backside) by two‐photon absorption—and, consequently, to generate free carriers with a remarkable spatial resolution. [ 119–134 ] The plasma production close to the logic gates of the irradiated device implies that some of the free carriers are able to migrate through a tunnel oxide so that the logic state of the microelectronic component (e.g., flash memory, photodiode) is modified in a stable manner after irradiation.…”
Section: Self‐limited Excitation With Ultrashort Pulsesmentioning
confidence: 99%
“…Data (read error count) from the host software was extracted, and the data points were plotted as a curve of soft error number with laser energy, as shown in Figure 6. When the pulsed laser energy is 814 pJ (corresponding to the LET value [6][7][8] of 37 MeV•cm 2 /mg), soft errors due to SEE start to be generated, so the SEU threshold for this SRAM device is 814 pJ (±81 pJ). With increasing laser energy, the number of errors increases.…”
Section: Soft Error Numbermentioning
confidence: 99%
“…There has been significant effort to use pulsed lasers and focused X-rays to generate SEEs in a manner akin to heavy ions, while offering refined spatial and temporal control of charge generation within devices. [54][55][56][57][58] Charge generation profiles for the three testing methods vary in the axial and radial dimensions. Heavy ions typically have linear charge generation profiles along the axial direction in the device.…”
Section: See Testingmentioning
confidence: 99%
“…By contrast, typical focused femtosecond pulsed-laser systems use optics that produce a charge generation profile described by single photon absorption (SPA) or Gaussian two-photon absorption (TPA). [54][55][56][57][58] If laser photon energy is above material bandgap then it is a SPA process. If laser photon energy is below bandgap then it is TPA process.…”
Section: See Testingmentioning
confidence: 99%