By transitioning from the silicon era to emerging graphene devices, it is evident that digital electronics will need Graphene Nanoribbon Field Effect Transistors (GNRFETs) with more than one ribbon. Tuning the gap between the graphene nanoribbons in these transistors is crucial for achieving optimum and accurate structural features. This paper investigates the effect of optimizing the gap between the graphene ribbons (ππ π) of a GNRFET on the device's performance. The non-equilibrium Green's function (NEGF) technique is employed to simulate quantum transport, whereas the Extended Huckel Theory (EHT) is used for computing. Two transistors are analyzed, each comprising two identical graphene ribbons with chirality (6,0) and (7,0). Additionally investigated is the impact of varying the ππ π parameter on the characteristic curve, Ion/Ioff ratio and subthreshold slope, density of states, transmission spectrum, Fermi levels, and Hartree potential. Using two graphene ribbons doubles the probability of electron transition compared to a single ribbon device, according to the results. Increasing ππ π increases the device's on-current while decreasing its off-current. Increasing the value of ππ π by 1nm results in a 300% improvement in the Ion/Ioff ratio; hence, choosing values larger than 1.5 nm for ππ π will significantly improve the Ion/Ioff ratio. In addition, the subthreshold slope for ππ π values higher than 1.5 nm are quite close to the fundamental limit of 60ππ£/πππ.