Negative resists of silicone-containing graft polymer for bilayer resist system

Tachibana, Yoshio; Yasuda, Yasutaro; Jitsumatsu, Tetsuji; Koseki, Ken’ichi; Yamaoka, Tsuguo

doi:10.1016/0032-3861(90)90164-t

Polymer

1990

DOI: 10.1016/0032-3861(90)90164-t

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Negative resists of silicone-containing graft polymer for bilayer resist system

Yoshio Tachibana¹,

Yasutaro Yasuda²,

Tetsuji Jitsumatsu³

et al.

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1992

1994

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Cited by 2 publications

References 11 publications

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Polymeric silicon‐containing resist materials

Miller

Wallraff

1994

Adv Material for Optics Elec

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Silicon-containing bilayer and trilayer photoresist technology is reviewed. Multilayer resist processes of this type rely on pattern generation in a thin imaging layer followed by pattern transfer to the thick planarising underlayer by oxygen reactive ion etching (RIE). The review concentrates on materials in which the silicon is an integral part of the polymer and does not specifically address photoresists where silicon is incorporated in a post-imaging process step (such as top-surface-imaging resists). The review is not exhaustive but emphasizes instead specific examples of representative resist chemistry.

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Polymeric silicon‐containing resist materials

Miller

Wallraff

1994

Adv Material for Optics Elec

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Resists for microlithography: Present status and recent research trends

Sugita

Ueno

1992

Progress in Polymer Science

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Negative resists of silicone-containing graft polymer for bilayer resist system

Cited by 2 publications

References 11 publications

Polymeric silicon‐containing resist materials

Polymeric silicon‐containing resist materials

Resists for microlithography: Present status and recent research trends

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