2023
DOI: 10.1016/j.sse.2022.108581
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Negative capacitance field-effect transistor with hetero-dielectric structure for suppression of reverse drain induced barrier lowering

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“…When we fabricate the NCFET device with the use of conventional or existing ferroelectric materials such as Barium Titanate (BTO) and Lead Zirconate Titanate (PZT), the thickness of the gate insulator layer should be such that it balances the large polarization charge density occurred by the ferroelectric material layer and FET channel charge density. It results in hundreds of nanometers, which is a challenging task for fabrication [14][15][16][17][18][19]. In recent years, ferroelectricity has been found in HfO 2 -based thin films that are done by controlling the crystalline phase of the films.…”
Section: Introductionmentioning
confidence: 99%
“…When we fabricate the NCFET device with the use of conventional or existing ferroelectric materials such as Barium Titanate (BTO) and Lead Zirconate Titanate (PZT), the thickness of the gate insulator layer should be such that it balances the large polarization charge density occurred by the ferroelectric material layer and FET channel charge density. It results in hundreds of nanometers, which is a challenging task for fabrication [14][15][16][17][18][19]. In recent years, ferroelectricity has been found in HfO 2 -based thin films that are done by controlling the crystalline phase of the films.…”
Section: Introductionmentioning
confidence: 99%