Near-surface structure of lithographic ink–fountain solution emulsions on model substrates

Thin-film models of liquid displacement on chemically patterned surfaces for lithographic printing processes

“…While a number of simplifications necessarily had to be made, the model we develop provides a relatively simple way to obtain estimates for important process parameters, and can serve as the basis for the development of more sophisticated models. In particular, it will be important to account for the mechanics of liquid transfer from one surface to another (e.g., from printing plate to blanket roll) as the surfaces separate, residual ink on the image areas [27], the influence of liquid additives on surface wettability [42], three-dimensional effects [43], and more realistic forms of the disjoining pressure [44].…”

“…In our experiments we used silicon substrates patterned by standard photolithographic techniques (see Ref. [42]) and coated them using a 15 wt.% aqueous dispersion of silica, obtained from Cabot Corporation. Details from the manufacturer reveal that the dispersion is composed of 20 nm individual particles in open clusters with a median aggregate diameter of 150 nm.…”

Dielectric Analysis of Different Natural and Synthetic Polymer Types

“…GA has been also used in the textile industry to improve the mechanical properties of fibers, and in pharmaceuticals to coat pills [95]. Because of the interesting binding properties, GA is also used in lithography [96], printing [97], and paints [98]. More recently, GA has been investigated as a surfactant for nanoparticles [99], nanocomposites [93], and sensors [100].…”