use of unique chemical, optical, and electrical properties of each metal component, one can obtain a homo-or heteromixture with unusual optical, electrical, chemical, and catalytic behaviors. On the basis of this knowledge, bi-, tri-, and even tetrametallic nanoscale structures have been synthesized by incorporating several metals into a single structure through various synthetic techniques. The controlled combination of multi-metals at the nanoscale offers an effective way of tuning the chemical and physical properties of nanostructures either by facilitating hybrid chemical, electronic, and magnetic interactions between metal components or by combining different properties associated with each pure component. These properties make multimetallic nanostructures a promising system for diverse applications. In particular, multimetallic nanostructures with spatial arrangement can advantageously be applied to electronics for sensing, charge transfer, and heat transfer behaviors.Controlled synthesis and positioning of multimetallic nanostructures have become increasingly important for systematic study. To date, several methods have been developed for ordered polyelemental nanostructures. For example, important advances have been made in ink-jet printing and blockcopolymer methods, in which two or three metal precursors are reduced in patterned polymer ink or a specific part of a block copolymer to produce bi-or tri-metallic nanospheres. [2] However, these approaches are considerably limited to the number of combinations of metals depending on the compatibility of elements and to the complex shape control of the nanostructures, which can change according to the demands of applications such as line shapes in electronics.In the present work, we developed a new method to fabricate a 3D polyelemental nanopattern with tunable combination, composition, shape, and array by using low-energy Ar + ion plasma. By using this approach, we achieved a 3D polyelemental nanopattern with high resolution (≈10 nm) and high aspect ratio (>20). Our system overcame limitations in terms of shape and arrangement and was adoptable to any metal combination. This method provides a simple and general approach for the fabrication of multimetallic nanopatterns regardless of the synthetic conditions of various metals. Furthermore, the structure formation during secondary sputtering was understood, andThe development of complex nanostructures containing a homo-and heteromixture of two or more metals is a considerable challenge in nanotechnology. However, previous approaches are considerably limited to the number of combinations of metals depending on the compatibility of elements, and to the complex shape control of the nanostructure. In this study, a significant step is taken toward resolving these limitations via the utilization of a low-energy argon-ion bombardment. The multilayer films are etched and re-sputtered on the sidewall of the pre-pattern, which is a secondary sputtering phenomenon. In contrast to the precursor mixing method, most metal...