2015
DOI: 10.1063/1.4927749
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Near-infrared photodetectors utilizing MoS2-based heterojunctions

Abstract: Near-infrared photodetectors are developed using graphene/MoS2 and WSe2/MoS2 vertical heterojunctions. These heterojunctions exhibit diode-rectifying behavior in the dark and enhanced photocurrent upon near-infrared irradiation. The photocurrent increases with increasing near-infrared power, leading to the photoresponsibility of 0.14 and 0.3 A W−1 for the graphene/MoS2 and WSe2/MoS2 heterojunctions, respectively, which are much higher than the photoresponsibility reported for a multilayer MoS2 phototransistor.

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Cited by 18 publications
(3 citation statements)
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“…Furthermore, 2DMCs/2DMCs vertical heterostructures, including MoS 2 /WSe 2 , MoTe 2 /MoS 2 , WS 2 /MoS 2 , MoSe 2 /WSe 2 , MoS 2 /CdTe, WS 2 /Bi 2 Te 3 , PbS/Cu 2 S, and GaSe/InSe, have also demonstrated distinct IR photoresponse. For example, Zhang et al have explored the photoresponse mechanism of a type‐II MoTe 2 /MoS 2 van der Waals heterostructures for IR light at 1550 nm, which breaks the limitation of intrinsic bandgap of the constituting material .…”
Section: Hybrid Heterostructures Based On 2d Metal Chalcogenides For mentioning
confidence: 99%
“…Furthermore, 2DMCs/2DMCs vertical heterostructures, including MoS 2 /WSe 2 , MoTe 2 /MoS 2 , WS 2 /MoS 2 , MoSe 2 /WSe 2 , MoS 2 /CdTe, WS 2 /Bi 2 Te 3 , PbS/Cu 2 S, and GaSe/InSe, have also demonstrated distinct IR photoresponse. For example, Zhang et al have explored the photoresponse mechanism of a type‐II MoTe 2 /MoS 2 van der Waals heterostructures for IR light at 1550 nm, which breaks the limitation of intrinsic bandgap of the constituting material .…”
Section: Hybrid Heterostructures Based On 2d Metal Chalcogenides For mentioning
confidence: 99%
“…Heavily n-type doped silicon was used for substrates with a certain SiO 2 layer thickness, whose capacitance per unit ( C ox ) is 3.18 nF/cm 2 . Heavily n-type doped silicon acts as the gate electrodes. PbPc films acted as a light-receiving layer; they were purchased from Sigma-Aldrich. The size of the substrate was 15 × 15 mm.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Due to the direct bandgap present in monolayer TMDs, they are good candidates for digital electronic applications, which triggered the researchers to use these materials for optoelectronic devices. MoS 2 and WS 2 have proved to be a good field effect transistor with high electron mobility and charge transfer [63][64][65][66][67][68][69][70][71][72]. The highest carrier mobility yet reported is by Wei Chen et al [33] is around 90 cm 2 V −1 s −1 with ON/OFF ratio of 10 7 .…”
Section: Introductionmentioning
confidence: 99%