Near-field, far-field and imaging properties of the 2D aperture SNOM

Novotny, Lukas; Pohl, Dieter; Regli, P.

doi:10.1016/0304-3991(94)00133-8

Cited by 36 publications

(11 citation statements)

References 8 publications

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“…Regarding optical fiber probe research, Novotny et al [11,12] employed the multiple multipole (MMP) method to estimate the distribution of near-field radiation and intensity of light source in the cases of metal-coated probe and medium probe. For one of the two cases, they investigate the influences of light crossing efficiency with the variations of taper and radius of aperture also.…”

Section: Introductionmentioning

confidence: 99%

The near-field power density distribution characteristics for different types of optical fiber probes

Lin

Yang

2005

Int J Adv Manuf Technol

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When the mechanism of near-field photolithography is analyzed, the most important work is the near-zone field analysis of the optical fiber probe. In this paper, the electromagnetic theory for near-field radiation using the magnetic current and electric current as sources is adopted as the model of the near-field optics. By applying this theorem, the near-field distribution characteristics of the uncoated probe and metal-coated probe are explored. Furthermore, the simulations of the nearfield for different light source, such as parallel beam of light (plane wave) and Gaussian-distributed light passing through the optical fiber probe are also discussed. Based upon the model of this research, the time-average Poynting vector distribution of the radiation field, and the relationship between the power density and near-field distance for the optical fiber probe can be estimated. According to the results, when the near-field distance between the metal-coated probe and sampling is maintained at 0.3ρ 0 ≤ Z ≤ 0.6ρ 0 , the process is proved to be more adequate for the near-field photolithography. Meanwhile, from the analysis of the near-field power density distribution, it provides an evaluation of concentration of photo active compound (PAC) in the photoresist after exposure and contour after development. The relationship between the power density and near-field distance can be used as a rule of tip-sampling distance modulation when controlling the magnitude of exposure energy. This near-field photolithography engineering perplexity encountered can therefore be solved.

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Section: Introductionmentioning

confidence: 99%

The near-field power density distribution characteristics for different types of optical fiber probes

Lin

Yang

2005

Int J Adv Manuf Technol

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“…Because considerable input laser pulse energy is required to offset losses from apertures of decreasing size, the trade-off between minimum aperture size and minimum required light throughput should be considered in materials processing applications. On the other hand, the minimum laser spot size at the NSOM tip output can be around 20-30 nm in diameter, as theoretically and experimentally investigated [106]. Because the laser beam spot size emitted from the NSOM probes is virtually independent of the laser light wavelength, the wavelength appropriate for the specific application can be selected, still maintaining the spot size smaller than the diffraction-limited size.…”

Section: Laser Irradiation Through Scanning Probes For Surface Nanopamentioning

confidence: 97%

Laser-based micro/nanoengineering for biological applications

Stratakis

Ranella

Farsari

et al. 2009

Progress in Quantum Electronics

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“…While the image contrast mechanism of aperture-based near-field microscopy is understood in its basics, 133 …”

Section: Scattering Fir-snimmentioning

confidence: 99%

High-frequency near-field microscopy

Rosner

Weide

2002

Review of Scientific Instruments

218

133

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Conventional optics in the radio frequency ͑rf͒ through far-infrared ͑FIR͒ regime cannot resolve microscopic features since resolution in the far field is limited by wavelength. With the advent of near-field microscopy, rf and FIR microscopy have gained more attention because of their many applications including material characterization and integrated circuit testing. We provide a brief historical review of how near-field microscopy has developed, including a review of visible and infrared near-field microscopy in the context of our main theme, the principles and applications of near-field microscopy using millimeter to micrometer electromagnetic waves. We discuss and compare aspects of the remarkably wide range of different near-field techniques, which range from scattering type to aperture to waveguide structures.

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Near-field, far-field and imaging properties of the 2D aperture SNOM

Cited by 36 publications

References 8 publications

The near-field power density distribution characteristics for different types of optical fiber probes

The near-field power density distribution characteristics for different types of optical fiber probes

Laser-based micro/nanoengineering for biological applications

High-frequency near-field microscopy

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