2003
DOI: 10.1063/1.1601311
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Nanowire-based very-high-frequency electromechanical resonator

Abstract: Fabrication and readout of devices with progressively smaller size, ultimately down to the molecular scale, is critical for the development of very-high-frequency nanoelectromechanical systems (NEMS). Nanomaterials, such as carbon nanotubes or nanowires, offer immense prospects as active elements for these applications. We report the fabrication and measurement of a platinum nanowire resonator, 43 nm in diameter and 1.3 μm in length. This device, among the smallest NEMS reported, has a fundamental vibration fr… Show more

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Cited by 322 publications
(252 citation statements)
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“…For instance, a suspended nanomechanical beam [25,26] which is excited to transverse vibrations behaves as a damped anharmonic resonator. Several experimental groups have observed the behavior described by the classical Duffing oscillator [27,28,29,30]. The transition to the quantum regime is currently in the focus of intense research [31,32,33,34,35,36].…”
Section: Discussionmentioning
confidence: 99%
“…For instance, a suspended nanomechanical beam [25,26] which is excited to transverse vibrations behaves as a damped anharmonic resonator. Several experimental groups have observed the behavior described by the classical Duffing oscillator [27,28,29,30]. The transition to the quantum regime is currently in the focus of intense research [31,32,33,34,35,36].…”
Section: Discussionmentioning
confidence: 99%
“…This could be implemented by placing a rigid electrically charged base elec- Figure 8.1 A 43 nanometer thick doubly-clamped platinum nanowire with an external electrode that can be used to tune its natural frequency as well as its nonlinear properties. Adapted with permission from [33].…”
Section: Nonlinearities Arising From External Potentialsmentioning
confidence: 99%
“…This differs significantly from previous NW-(ref. 17) and nanotube-based NEMS (ref. 18) that use a thin evaporated top metal as a mechanical anchor and are released by selective wet etching of an underlying SiO 2 layer.…”
mentioning
confidence: 99%